Silicon micro mechanical pressure switch, preparation method and uses thereof
A pressure switch, silicon micromechanical technology, applied in the field of micromechanical pressure switch devices based on MEMS technology
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[0025] The specific structure of the pressure switch will be explained in detail below in combination with the technological process provided by the present invention.
[0026] (1) On the polished single crystal silicon wafer 1, thermal silicon oxide is formed by high temperature oxidation, and the thickness of the oxide layer is 2 microns, which is used as a mask for wet etching. The pattern of the photoresist cavity, using the photoresist as a mask, first use dilute hydrofluoric acid (NH 4 F: HF = 7: 1) etch silicon oxide, and then remove the glue, use silicon oxide as a mask, wet-etch single crystal silicon with KOH at a certain temperature, form a prism-shaped air cavity and a square silicon elastic film, silicon The linear dimension of the elastic film is 1mm x 1mm square, see diagram 2-1 .
[0027] (2) On the other side of the single crystal silicon wafer 1, thermal oxidation of silicon is formed by high-temperature oxidation, and the thickness of the oxide layer is 1...
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