Two-dimensional coding normalization mask target combination and its alignment method and aligning system

Abstract

The invention discloses a two-dimension encoding normalization aligning mark assembly alignment method and aligning system thereof. The two-dimension encoding normalization aligning mark assembly is composed of a stephanoporate aligning mark arranged at the aligning system target composition component and a single hole aligning mark arranged at the detecting composition component, wherein, the stephanoporate aligning mark is composed of a two-dimension encoding light transmission inner core, four diagonal two-dimension encoding light transmission elements and a chrome plating shielding layer; and the single hole aligning mark is composed of light transmission elements and a chrome plating shielding layer. The method uses the single hole aligning mark on the detecting composition component and the detecting devices under the single hole aligning mark to execute twice of two-dimension aligning scan to images formed by the stephanoporate aligning mark on the aligning system target composition component, and synthetizes the radiation measurement information and the position measurement information obtained by twice scans to execute aligning signal processing, thereby obtaining a space image of the target composition component on the target composition component bearing stage formed through the projecting system, and the position relation relative to the detecting composition component bearing stage.

Description

technical field [0001] The invention relates to an alignment scanning method of a lithographic equipment, in particular to a combination of two-dimensional coded normalized alignment marks of a lithographic equipment and an alignment scanning method thereof. Background technique [0002] In industrial devices, due to the need for high precision and high productivity, a large number of detection devices and control systems for high-speed real-time measurement, signal sampling, data acquisition, data exchange and communication transmission are distributed. These systems require us to use various methods to realize the control of detection, signal sampling control, data acquisition control, data exchange control and data transmission communication. Devices that require detection and control include: integrated circuit manufacturing lithography equipment, flat panel display panel lithography equipment, MEMS / MOEMS lithography equipment, advanced packaging lithography equipment, p...

AI Technical Summary

Problems solved by technology

[0006] In the previous above-mentioned devices, due to the large and concentrated light transmission area of ​​the single-hole-shaped normalized alignment mark on the patterning part, there is a problem that the detection and imaging energy density is relatively large, and its detection and capture range is relatively small, especially The flat top and trapezoidal slope section of the alignment scanning signal are short. When the scanning speed is high, the number of sampling points in this section is insufficient, which is not conducive to meeting the accuracy requirements of alignment scanning positioning and rough capture. If you need to add enough sampling points , on the one hand, the alignment scanning speed can be reduced, but this will reduce the throughput of the lithography device; on the other hand, the size of the single-hole-shaped normalized alignment mark on the target patterning part can be increased, but the imaging area is increased , which is not conducive to improving the stability accuracy of the alignment scan

[0007] For conventional porous-shaped normalized alignment marks, on the one hand, there are the above-mentioned problems, and on the other hand, there are multi-step alignment scan signals or convex / concave inflection points in the alignment scan signal, which are not conducive to improving the normalization. Accuracy and adaptability requirements of alignment scanning

[0008] In addition, the above-mentioned single-well-shaped normalization alignment markers and conventional multi-well-shape normalization alignment markers have a smaller capture range

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