Method for measuring optical non-linear 4f phase coherent imaging
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SUZHOU UNIV
- Publication Date
- 2008-11-19
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a method for measuring the nonlinear properties of materials by using optical means, in particular to a method for measuring the optical nonlinearity of medium interface reflection based on reflection 4f phase coherent imaging technology and the method for measuring the optical nonlinearity of thin films by using reflected light. In the field of linear photonic materials and nonlinear optical information processing. Background technique
[0002] With the rapid development of technologies in the fields of optical communication and optical information processing, the research on nonlinear optical materials is becoming increasingly important. The realization of functions such as optical logic, optical memory, optical transistor, optical switch and phase complex conjugation mainly depends on the research progress of nonlinear optical materials. Optical nonlinear measurement technology is one of the key technologies for studying no...