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Position control method and device based on H type structure two-sided driving system

A dual-side drive and controller technology, applied in photoplate-making process exposure devices, microlithography exposure equipment, etc., can solve problems such as non-feedback, phase inconsistency, restricting the performance of control methods, and achieve precise positioning and position error reduction. , to improve the dynamic performance and the effect of parameter mismatch

Active Publication Date: 2011-08-10
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The parallel control method is the independent control of the bilateral motors, which do not interact with each other, and the disturbance on either side will not affect the other side. However, once a disturbance occurs on one side, due to the lack of mutual feedback, it belongs to open-loop control. At this time, the synchronization of the system will be difficult to guarantee
At this time, the Rz axis is generally used to correct this out-of-synchronization, but this method not only adds one more control axis, but also causes the position deviation phase of the two synchronous axes to be inconsistent, which also affects the control accuracy.
The master-slave control method can improve the tracking performance of the controller. The position of any master and the disturbance of the load can be accurately reflected on the slave. The slave can accurately track the master, but the disturbance on the slave cannot be fed back to the master, and The speed of the latter motor lags slightly behind that of the former one, and the following performance during the start-up process is not ideal, which restricts the improvement of the performance of this control method

Method used

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  • Position control method and device based on H type structure two-sided driving system
  • Position control method and device based on H type structure two-sided driving system
  • Position control method and device based on H type structure two-sided driving system

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Embodiment Construction

[0069] The present invention involves bilateral synchronous control of two linear motors in the Y direction. In the bilateral drive control, the outputs of the two servo systems are coupled together through the beam and the X motor, and the two motors are driven to move according to the same given signal, and there is no direct coupling relationship in electrical parameters. In an ideal state, assuming that the various performances of the two linear motors are exactly the same, and the loads acting on them are completely symmetrical, then when the same command is input, the two motors should move at the same acceleration, speed, and displacement. However, in actual situations, the performance of any two motors will not be exactly the same, and the dynamic change of the loads of the two caused by the movement of the X-direction linear motor on the beam will cause the speed of the motor to change, thus causing The position is not synchronous. In order to bring the servo system b...

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Abstract

The invention provides a locating method and a corresponding apparatus used for an H-shaped drive structure. An X direction linear motor is adopted to realize an X axis movement and a Y1Y2 double-linear motor is adopted to realize a Y axis movement; the cross-coupling of two motors, namely, Y1 and Y2, is adopted to realize the control of reducing relative position errors; the cross-coupling of X axis and Y axis is adopted to realize the control of reducing contour errors; the control to the cross-coupling of three linear motors is adopted to reduce synchronous position errors and contour errors so as to realize the requirement of adopting the double-drive to synchronously control the accurate locating.

Description

technical field [0001] The invention relates to photolithography equipment in the field of front-end semiconductors, in particular to a positioning control method and device for a bilateral drive system in a photolithography machine. Background technique [0002] The silicon wafer production process includes a series of extremely complex, expensive, and time-consuming lithography processes, and the lithography accuracy and productivity of the lithography machine directly determine the design and manufacture of lithography equipment. As the market's demand for photolithography productivity increases, it is also required to improve and enhance the exposure quality and exposure accuracy of the system. In this context, the actuator is required to have high positioning accuracy when moving at high speed with large inertia. [0003] At present, the ways of bilateral synchronous driving are mainly parallel control and master-slave control. The parallel control method is the indep...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 赵娟吴立伟陈锐
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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