Micro-adjusting device of optical element

Abstract

The invention provides a micro-adjustment device for an optics component, which comprises: an inner lens cone which can keep the optics component, at least three groups of friction positioning devices and an exterior lens cone which is used for bearing and storing the inner lens cone and the friction positioning device; the optics component is arranged in the inner lens cone along the radial direction, an axial line is along the weight direction, the three groups of friction positioning devices are completely arranged around the inner lens cone, one end of the device is fixedly connected with the inner lens cone, and the other end is connected with the exterior lens cone and used for keeping slide restriction; a group of weight balance plate springs is evenly arranged around the inner lens cone, and a schistocity plane of the plate spring is in parallel along the radial direction of the inner lens cone optics component, one end of the plate spring is connected with a base plate of the exterior lens cone, and the other end is connected with the inner lens cone. The friction positioning device can adjust the positioning optics component along the axial line of the optics component direction through a piezoelectric executor, and is provided with three free-degree adjusting capability of high precision long routing.

Description

technical field [0001] The invention relates to a high-precision optical element adjustment system, in particular to a fine adjustment system. Background technique [0002] Optical precision instruments and machinery require the optical components to have the characteristics of high precision, low heat dissipation and long stroke in many occasions. For example, in the process of semiconductor components, the lithography step using exposure equipment plays a key role. With the high integration of semiconductor components in IC manufacturing, the line width of lithography is getting smaller and smaller, requiring lithography machines to perform high The image transfer of subtle graphics under high precision puts forward more stringent requirements on the wave aberration or distortion of the projection optical system to compensate for environmental changes of the projection optical system (such as thermal influence, etc.). Waveform aberration or distortion is determined by the...

AI Technical Summary

Problems solved by technology

[0003] In the patent document with the publication number CN1317725A, an optical element holding device of exposure equipment is disclosed, which can drive the optical element with high precision for long-stroke adjustment. It uses three piezoelectric actuators, which has a simple structure and is easy to manufacture. The control method is also easy to implement, but there is a disadvantage, in which the amplifying mechanism reduces the rigidity of its structure while increasing the adjustment stroke of the optical mechanism, so that the stability of the system is reduced while adjusting the optical elements

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