Projection objective magnification error and distortion detection device and method

Abstract

The invention provides a detector for the magnification and distortion of projection lenses and a method thereof. The method comprises: preparing a measurement mask plate provided with grid transparent marks; providing a mask plate which chromium plating surface is coated with positive photoresist and has not patterns, as a transfer mask plate; using the method of object image alternative exposure, and the relative devices such as gumming development, etching and overlay measurement and the like, to measure the magnification error and distortion of a projection lens fixed on the detector. The detector and the method can be used to measure the magnification error and distortion of projection lenses can eliminate the system error caused by the traditional methods as standard grid template and the like and is especially suitable for the detector system applied for measuring the projection objective lens which nominal magnification is -1 around.

Description

technical field [0001] The invention belongs to the field of performance detection of projection optical systems, in particular to a detection device and method for magnification error and distortion of a projection objective lens. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system of lithography machines has been gradually improved. At present, lithography machines have been successfully used in the field of integrated circuit manufacturing with submicron and deep submicron resolution. When using a lithography machine to manufacture integrated circuit chips, the projection objective lens is required to have a high resolution to achieve the preparation of highly integrated chips. At the same time, the optical imaging system for projection exposure is required to have small magnification errors and distortions to meet the requirements of the chip. During fabrication, the interconnections be...

AI Technical Summary

Problems solved by technology

[0004] The general method in the prior art as mentioned above has the following uncorrectable systematic errors: first, there is an error in the template graphic itself, and its grid is not ideal, and the measured lens magnification error and distortion include the error of the template graphic itself, In the measurement results, it is impossible to distinguish between the error of the template graphic itself and the error of the projection objective lens; in addition, no matter whether the method of scanning the field of view or the method of measuring the exposure pattern is adopted, due to the positioning error of the measurement equipment itself, the final reading includes the factors of the measurement equipment , the measurement results also cannot identify this part of the error

[0005] The problems existing in the measurement method in the aforementioned prior art will also directly affect the final performance of the lithography equipment

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