Projection objective magnification error and distortion detection device and method

A technology of projection objective lens and detection device, which is applied in the field of performance detection of projection optical system, and can solve problems such as inability to identify errors, affect the final performance of lithography equipment, and inability to distinguish template graphic projection objective errors, etc.

Active Publication Date: 2009-03-18
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology

[0004] The general method in the prior art as mentioned above has the following uncorrectable systematic errors: first, there is an error in the template graphic itself, and its grid is not ideal, and the measured lens magnification error and distortion include the error of the template graphic itself, In the measurement results, it is impossible to distinguish between the error of the template graphic itself and the error of the projection objective lens; in addition, no ma

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  • Projection objective magnification error and distortion detection device and method
  • Projection objective magnification error and distortion detection device and method
  • Projection objective magnification error and distortion detection device and method

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[0021] The detection device and method of the projection objective lens magnification error and distortion of the present invention will be described in further detail below in conjunction with a preferred embodiment.

[0022] See figure 1 , Is a schematic block diagram of a preferred embodiment of the projection objective lens magnification and distortion detection device of the present invention. As shown in the figure, in this embodiment, the projection objective lens magnification and distortion detection device includes a frame unit 1, a projection The objective lens 2, the projection objective lens fixing unit 3, the wafer unit 4, the plate unit 5, the illumination unit 6, the measurement mask 7 and the transfer mask 8.

[0023] See also figure 2 , image 3 , The projection objective lens 2 is installed on the frame unit 1 through the projection objective lens fixing unit 3, and the chrome-plated surface 701 of the measurement mask 7 containing the grid-like arrangement of...

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Abstract

The invention provides a detector for the magnification and distortion of projection lenses and a method thereof. The method comprises: preparing a measurement mask plate provided with grid transparent marks; providing a mask plate which chromium plating surface is coated with positive photoresist and has not patterns, as a transfer mask plate; using the method of object image alternative exposure, and the relative devices such as gumming development, etching and overlay measurement and the like, to measure the magnification error and distortion of a projection lens fixed on the detector. The detector and the method can be used to measure the magnification error and distortion of projection lenses can eliminate the system error caused by the traditional methods as standard grid template and the like and is especially suitable for the detector system applied for measuring the projection objective lens which nominal magnification is -1 around.

Description

technical field [0001] The invention belongs to the field of performance detection of projection optical systems, in particular to a detection device and method for magnification error and distortion of a projection objective lens. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system of lithography machines has been gradually improved. At present, lithography machines have been successfully used in the field of integrated circuit manufacturing with submicron and deep submicron resolution. When using a lithography machine to manufacture integrated circuit chips, the projection objective lens is required to have a high resolution to achieve the preparation of highly integrated chips. At the same time, the optical imaging system for projection exposure is required to have small magnification errors and distortions to meet the requirements of the chip. During fabrication, the interconnections be...

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Application Information

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IPC IPC(8): G03F7/20G02B27/00G01M11/02
Inventor 杨志勇
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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