Unlock instant, AI-driven research and patent intelligence for your innovation.

Photosensitive composition, phososensitive film, photosensitive laminated body, permanent pattern forming method and printed substrate

A technology of photosensitive composition and compound, which is applied in the direction of printed circuit, microlithography exposure equipment, and photosensitive material used in optomechanical equipment, etc. It can solve the problem of insufficient storage stability of sensitive material, significant coloring of adhesive resin, Solve problems such as poor color and taste of sensitive materials, achieve high efficiency and stability over time, reduce coloring, and inhibit color and taste from deteriorating

Inactive Publication Date: 2009-04-01
FUJIFILM CORP
View PDF42 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, in these methods, the storage stability of the sensitive material is insufficient, the coloring of the binder resin is remarkable, and the problems of poor color and smell of the sensitive material have not been solved.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive composition, phososensitive film, photosensitive laminated body, permanent pattern forming method and printed substrate
  • Photosensitive composition, phososensitive film, photosensitive laminated body, permanent pattern forming method and printed substrate
  • Photosensitive composition, phososensitive film, photosensitive laminated body, permanent pattern forming method and printed substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0316] Hereinafter, the present invention will be further specifically described using examples, but the present invention is not limited thereto.

Synthetic example 1

[0318] — Synthesis of Adhesive 1 —

[0319] 159 g of 1-methoxy-2-propanol was charged into a 1,000 mL three-necked flask, and heated to 85° C. under a nitrogen stream. A 159 g 1-methoxy-2-propanol solution of 63.4 g of benzyl methacrylate, 72.3 g of methacrylic acid, and 3.0 g of V-601 (manufactured by Wako Pure Chemical Industries) was added dropwise thereto over 2 hours. After completion of the dropwise addition, the mixture was further heated for 5 hours to allow a reaction. Heating was then stopped to obtain a copolymer of benzyl methacrylate / methacrylic acid (30 / 70 mol % ratio).

[0320] Next, 120.0 g of the copolymer solution was transferred to a 300 mL three-necked flask, 16.6 g of glycidyl methacrylate and 0.16 g of p-methoxyphenol were added, and stirred to dissolve. After dissolution, 3.0 g of triphenylphosphine was added while blowing air, and heated to 100° C. After 20 minutes, glycidyl methacrylate was added to perform an addition reaction. The disappearance of...

Synthetic example 2

[0334] — Synthesis of Adhesive 2 —

[0335] Synthesis was carried out in the same manner as in Synthesis Example 1, except that the elapsed time after addition of triphenylphosphine was 25 minutes. The value of the residual TPP amount was 600 ppm in terms of solid content relative to the solid content of the binder.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Epoxy equivalentaaaaaaaaaa
Epoxy equivalentaaaaaaaaaa
Epoxy equivalentaaaaaaaaaa
Login to View More

Abstract

A photosensitive composition according to the invention comprises an adhesive formed by the following modified copolymer, a polymerized compound, a photopolymerization initiating agent, a thermal cross-linking agent and a catalyst. The modified polymer is obtained through adding (methyl) glycidyl acrylate on one part of acid group of copolymer which is obtained from (methyl) acrylate (A) and a compound that contains an unsaturated group and is provided with at least one acid group. The invention is characterized in that the residual quantity of catalyst is below 500ppm (parts per million) by weight.

Description

technical field [0001] The present invention relates to a photosensitive composition, a photosensitive film, and a photosensitive laminate that are excellent in sensitivity and storage stability and capable of efficiently forming high-definition permanent patterns (protective films, interlayer insulating films, solder resist patterns, etc.) , a method for forming a permanent pattern using the photosensitive composition, and a printed substrate (original text in Japanese: プリント substrate) on which a permanent pattern is formed by the method for forming a permanent pattern. Background technique [0002] Conventionally, when forming permanent patterns, such as a solder resist pattern, the photosensitive film which forms the photosensitive layer by apply|coating and drying a photosensitive composition on a support body is used. As a method of manufacturing the permanent pattern, for example, the photosensitive film is laminated on a substrate such as a copper-clad laminate formed...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/028G03F7/004G03F7/09G03F7/20H05K1/00
Inventor 林利明有冈大辅
Owner FUJIFILM CORP