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Titanium dioxide compound film optoelectronic pole and its production method

A technology of composite thin film and titanium dioxide is applied in the field of dye-sensitized solar cell materials to achieve the effects of reducing cost, improving photoelectric conversion performance and simple process

Inactive Publication Date: 2009-04-08
CHONGQING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a titanium dioxide composite thin film photoelectrode and its preparation method for the shortcomings of the existing dye-sensitized solar cell photoelectrode composite film, which has the advantages of simple preparation process, obvious performance improvement, and can use less dye Obtain remarkable features such as high photoelectric conversion efficiency

Method used

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  • Titanium dioxide compound film optoelectronic pole and its production method
  • Titanium dioxide compound film optoelectronic pole and its production method
  • Titanium dioxide compound film optoelectronic pole and its production method

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Experimental program
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Embodiment 1

[0023] A titanium dioxide composite film photoelectrode is composed of a conductive substrate and a titanium dioxide composite film. Wherein, the conductive substrate is commercially available FTO conductive glass. The titanium dioxide composite film is composed of a layer of low-crystallinity TiO2 interconnected by spherical particles with a particle size of about 10-50 nm. 2 Mesoporous film and a layer of anatase TiO interconnected by nanocrystals with a particle size of 20-50nm 2 Composed of mesoporous films, the thickness of the composite film is 15 μm. Its low crystallinity TiO 2 Mesoporous Thin Film Layer and Anatase Nanocrystalline TiO 2 The thickness ratio of the mesoporous thin film layer is 1:0.5.

[0024] A preparation method of a titanium dioxide composite film photoelectrode, the specific steps are as follows:

[0025] (1) Preparation of low crystallinity TiO 2 Mesoporous film

[0026] Low crystallinity TiO composed of spherical particles with a particle si...

Embodiment 2

[0030] A titanium dioxide composite thin film photoelectrode, the same as embodiment 1, is characterized in that: the thickness of the composite thin film is 12 μm, low crystallinity TiO 2 Mesoporous thin film layer: anatase nanocrystalline TiO 2 The thickness ratio of the mesoporous thin film layer is 1:1.

[0031] The specific steps of a preparation method of a titanium dioxide composite thin film photoelectrode are as follows:

[0032] (1) Preparation of low crystallinity TiO 2 Mesoporous film

[0033] With embodiment 1. Features: Drying at 150°C for 10 minutes, calcining at 450°C for 30 minutes, low crystallinity TiO 2 The thickness of the mesoporous film is 6 μm.

[0034] (2) Preparation of titanium dioxide composite thin film photoelectrode

[0035] With embodiment 1. The characteristics are: drying at 100°C for 5 minutes, calcining at 450°C for 30 minutes, anatase nanocrystalline TiO 2 The thickness of the mesoporous film is 6 μm, and the low crystallinity TiO ...

Embodiment 3

[0037] A titanium dioxide composite film photoelectrode, the same as embodiment 1, is characterized in that: the thickness of the composite film is 14 μm, low crystallinity TiO 2 Mesoporous thin film layer: anatase nanocrystalline TiO 2 The thickness ratio of the mesoporous thin film layer is 1:0.4.

[0038] The specific steps of a preparation method of a titanium dioxide composite thin film photoelectrode are as follows:

[0039] (1) Preparation of low crystallinity TiO 2 Mesoporous film

[0040] With embodiment 1. Features: Drying at 150°C for 10 minutes, calcining at 450°C for 30 minutes, low crystallinity TiO 2 The thickness of the mesoporous film is 10 μm.

[0041] (2) Preparation of titanium dioxide composite thin film photoelectrode

[0042] With embodiment 1. The characteristics are: drying at 100°C for 5 minutes, calcining at 450°C for 30 minutes, anatase nanocrystalline TiO 2 The thickness of the mesoporous film is 4 μm, low crystallinity TiO 2 Mesoporous Th...

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Abstract

The invention provides a TiO2 composite film photo-electrode and a preparation method thereof, relating to a DSC composite film photo-electrode and the preparation method thereof. The composite film photo-electrode comprises a conductive substrate and a TiO2 composite film; the composite film consists of a layer of TiO2 with low crystallinity, and a layer of anatase nanometer crystal TiO2 meso-porous film. The method comprises the steps as follows: the TiO2 film with low crystallinity is firstly prepared on the conductive substrate; subsequently, the anatase nanometer crystal TiO2 meso-porous film is prepared on the conductive substrate to gain the finished product. The optical current of the DSC assembled by the TiO2 composite film photo-electrode is up to 21.98mA / cm<2> and the total photoelectric conversion efficiency thereof reaches 6.89% which is higher by 47%. The DSC assembled by the TiO2 composite film photo-electrode is obviously improved on the photoelectric conversion efficiency. The method has simple process and low cost. The DSC assembled by TiO2 composite film photo-electrode prepared by the preparation method can be widely applied to a large area photoelectric conversion system and is especially suitable for external walls, roofs, doors and windows, glass curtain walls and the like which are combined with the building.

Description

1. Technical field [0001] The invention belongs to the technical field of dye-sensitized solar cell materials, in particular to a composite film photoelectrode of a dye-sensitized solar cell (DSC) and a preparation method thereof. 2. Background technology [0002] Dye-sensitized Solar Cell (DSC) has the advantages of lower cost and environmental protection than conventional solar cells, and is a promising new technology for solar photoelectric conversion. Although the photoelectric conversion efficiency of DSC is not high enough, due to its low cost, it is only 1 / 10 of monocrystalline silicon solar cells, and its low efficiency can be made up for by using a large area. Therefore, it is very suitable for use in combination with buildings, such as building exterior walls, roofs, doors and windows, glass curtain walls, etc., and is expected to become the most promising battery power supply for large-area power supply systems. [0003] Dye-sensitized solar cells use wide-bandga...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01G9/20H01G9/04H01M14/00H01L31/0224H01L31/18
CPCY02E10/542Y02B10/12Y02B10/10Y02P70/50
Inventor 唐笑钱觉时王智党玉栋万煜王华
Owner CHONGQING UNIV
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