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Multilayer medium double silver layer low-radiation film and production technique thereof

A technology of multi-layer dielectric and low-emissivity film, applied in metal material coating technology, layered products, metal layered products, etc., can solve the problem that the transmittance and shading coefficient cannot be taken into account at the same time, and the selection coefficient can only reach 1.4, etc. problems, to achieve the effect of easy adjustment, high transmittance, and low shading coefficient

Active Publication Date: 2012-08-22
HUNAN YUFENG VACUUM SCI & TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The product cannot take into account the two indicators of transmittance and shading coefficient at the same time, and the selection coefficient can only reach 1.4

Method used

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  • Multilayer medium double silver layer low-radiation film and production technique thereof
  • Multilayer medium double silver layer low-radiation film and production technique thereof
  • Multilayer medium double silver layer low-radiation film and production technique thereof

Examples

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Embodiment 1

[0033] Embodiment 1, the multilayer dielectric film layer of the present invention adopts: TiOx / SnOy / ZnO:Al, the film layer of barrier layer adopts: NiCrOx, the film structure that constitutes the present invention is: glass / TiOx / SnOy / ZnO:Al / Ag / NiCrOx / TiOx / SnOy / ZnO:Al / Ag / NiCrOx / TiOx / SnOy / ZnO:Al / Si 3 N 4 . The production process of this application example is:

[0034] (1) substrate cleaning;

[0035] (2) Enter the vacuum sputtering area;

[0036] (3) Double rotating cathode, TiOx ceramic target material, TiOx film deposited by intermediate frequency reactive magnetron sputtering, film thickness 10-15nm;

[0037] (4) Double rotating cathodes, Sn metal target, medium frequency reactive magnetron sputtering deposition of SnOy film, film thickness 10-15nm;

[0038] (5) Double rotating cathode, ZnO:Al ceramic target material (Al content 2wt%), intermediate frequency reactive magnetron sputtering deposition ZnO:Al film layer, film thickness 10-15nm;

[0039] (6) Rotating cath...

Embodiment 2

[0051] Embodiment 2, the composition of the multilayer dielectric film layer 1, 2 or 3 of the present invention can also be: SnOy / Si 3 N 4 / SnOy, ZnOx / SnOy / ZnOx, TiOx / SnOy / TiOx, or NbOy / Si 3 N 4 / NbOy, etc., the multilayer dielectric film layers 1, 2 and 3 can be the same any one of the above-mentioned film structures, or can be different any two or three of the above-mentioned film structures. The barrier layer 1 or 2 can be made of: NiCr, Nb, Ti, NiCrOx, or NbOx. The film layer of the barrier layer 1 or 2 can be the same any one of the above-mentioned film structures, or can be different of any two of the above-mentioned film structures. The material used for the substrate may include glass, plastic and other soft substrates and other materials available for film formation. refer to figure 1 with figure 2 , all the other are with embodiment 1.

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Abstract

A double silver-layer low-radiation film of a multi-layer medium and the producing technology pertain to the double silver-layer low-radiation film and the producing technology. The invention mainly aims at solving the technical problems that the product of the existing double silver-layer low-e film can not give consideration to two indicators of transmittance and sunshade coefficient simultaneously, and the like. The points of the technical proposal are as follows: the double silver-layer low-radiation film-coating product is made by the method of magnetron sputtering film-coating in vacuum. The product includes a substrate, a multi-layer medium film layer 1, an Ag layer, a barrier layer, a multi-layer medium film layer 2, the Ag layer, the barrier layer, the multi-layer medium film layer 3, and Si3N4. The composing mode of the multi-layer medium film layers 1, 2 or 3 includes TiOx / SnOy / ZnO: Al, SnOy / Si3N4 / SnOy, ZnOx / SnOy / ZnOx, TiOx / SnOy / TiOx, or NbOy / Si3N4 / NbOy. The technology has higher transmittance and lower sunshade coefficient simultaneously, thus being convenient to the adjustment the appearance color and the indoor color. The product can be widely applied in the fields of buildings and windscreens of vehicles and ships, and can also be used as a sticking film by being coated on the soft substrate.

Description

technical field [0001] The invention relates to a double-silver low-radiation film. Background technique [0002] At present, the low-E coating products on the market can be roughly divided into two categories: one is high visible light transmittance and high shading coefficient; the other is low visible light transmittance and low shading coefficient. The market still lacks a product that has a high visible light transmittance while satisfying a low shading coefficient, that is, a high selectivity coefficient. [0003] The film structure of traditional low-E coating products is generally: [0004] Glass / bottom dielectric film / barrier layer / Ag layer / barrier layer / top dielectric layer; [0005] Or: glass / bottom dielectric film / Ag layer / barrier layer / intermediate dielectric film / Ag layer / barrier layer / top dielectric layer. [0006] In the above two structures, there is a common feature that the dielectric film adopts a single layer. The product cannot take into account the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B32B15/04B32B9/04C23C14/35C23C14/06
Inventor 陈理李国强
Owner HUNAN YUFENG VACUUM SCI & TECH CO LTD
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