Photomask, manufacturing method thereof, and pattern transfer print method
A mask pattern and manufacturing method technology, applied in the field of photomasks, can solve the problems of static electricity damage, static electricity generated by light-shielding patterns, damage increase, etc., and achieve the effect of suppressing static electricity damage
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[0044] Hereinafter, the best mode for carrying out the present invention will be described with reference to the drawings.
[0045] figure 1 It is a sectional view for explaining the pattern transfer method using the gray scale mask which is one embodiment of this invention. figure 1 The grayscale mask 20 shown is used to form a resist pattern 33 having a film thickness stepwise different on the transfer target body 30 . In addition, in figure 1 In , symbols 32A and 32B denote films laminated on the substrate 31 in the body to be transferred 30 .
[0046] figure 1 The grayscale mask 20 shown has a mask pattern on a transparent substrate 24, and the mask pattern is formed by a light shielding portion 21 that shields exposure light (the transmittance is about 0%) when the grayscale mask 20 is used. , the translucent part 22 through which the exposure light exposed on the surface of the transparent substrate 24 passes, and the translucent part which reduces the transmitta...
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