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X-ray sensitive resin composition, barrier body and protection film of liquid crystal display member and their forming methods

A technology of liquid crystal display element and resin composition, which is applied in nonlinear optics, photoengraving process of pattern surface, optics and other directions, can solve the problems of poor panel, insufficient strength of patterned film, and inability to obtain pattern size, etc. Excellent chemical properties, excellent long-term reliability, and the effect of suppressing the occurrence of afterimages

Active Publication Date: 2013-06-12
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, if a spacer or a protective film is formed through a low-exposure radiation irradiation process that shortens the irradiation time using a previously known radiation-sensitive resin composition, there will be the following problems: the strength of the resulting patterned film is insufficient, or The size of the pattern is smaller than the required value, and the required pattern size cannot be obtained, which becomes a cause of panel failure
[0009] However, a radiation-sensitive resin composition satisfying all the above-mentioned requirements has not been known so far.

Method used

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  • X-ray sensitive resin composition, barrier body and protection film of liquid crystal display member and their forming methods
  • X-ray sensitive resin composition, barrier body and protection film of liquid crystal display member and their forming methods
  • X-ray sensitive resin composition, barrier body and protection film of liquid crystal display member and their forming methods

Examples

Experimental program
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Embodiment

[0287] Hereinafter, although a synthesis example and an Example are illustrated and this invention is demonstrated more concretely, this invention is not limited to the following description.

[0288] In the following synthesis examples, the weight-average molecular weight Mw of the copolymer was measured by gel permeation chromatography (GPC) using the following apparatus and conditions.

[0289] Device: GPC-101 (manufactured by Showa Denko Co., Ltd.)

[0290] Column: GPC-KF-801, GPC-KF-802, GPC-KF-803, and GPC-KF-804 (the above are all trade names, manufactured by Showa Denko Co., Ltd.).

[0291] Mobile phase: tetrahydrofuran containing 0.5% by weight phosphoric acid.

[0292]

Synthetic example 1

[0294] In the flask equipped with cooling tube and stirrer, add 5 parts by weight of 2,2'-azobis(isobutyronitrile) and 250 parts by weight of propylene glycol monomethyl ether acetate. Continue to add 5 parts by weight of styrene, 10 parts by weight of methacrylic acid, 5 parts by weight of acrylic acid, 25 parts by weight of n-butyl methacrylate, 30 parts by weight of benzyl methacrylate and 20 parts by weight of 2-hydroxyethyl methacrylate After the ester was replaced with nitrogen, 5 parts by weight of 1,3-butadiene was added, and the temperature of the solution was raised to 80° C. while stirring slowly, and the temperature was maintained for 5 hours for polymerization to obtain a copolymer containing (P-1 )The solution.

[0295] Add 15 parts by weight of 2-methacryloyloxy ethyl isocyanate, 0.6 part by weight of dibutyltin laurate and 0.05 part by weight of 4-methoxyphenol in the solution containing copolymer (P-1) in the obtained The reaction was carried out at 60° C. fo...

Synthetic example 2

[0297] In the flask equipped with cooling tube and stirrer, add 5 parts by weight of 2,2'-azobis(isobutyronitrile) and 250 parts by weight of 3-methoxybutyl acetate. Continue to add 18 parts by weight of methacrylic acid, 30 parts by weight of methacrylic acid tricyclic [5.2.1.0 2，6] decan-8-yl ester, 5 parts by weight of styrene, 25 parts by weight of 2-(6-hydroxyethylhexanoyloxy) ethyl methacrylate (trade name PLACCEL FM1D (produced by Daicel Chemical Industry Co., Ltd.) ) and 17 parts by weight of tetrahydrofurfuryl methacrylate, after replacing with nitrogen, add 5 parts by weight of 1,3-butadiene, stir slowly while making the temperature of the solution rise to 80°C, and keep the temperature for 4 After one hour, the temperature was raised to 100° C. and kept at this temperature for 1 hour to carry out polymerization to obtain a solution containing the copolymer (P-2).

[0298] Add 14 parts by weight of 2-methacryloyloxyethyl isocyanate and 0.05 parts by weight of 4-meth...

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Abstract

The invention provides a ray sensitivity resin combination, spacer and protection film of liquid crystal display element and formation method thereof. The ray sensitivity resin combination has high ray sensitivity and is capable of manufacturing a pattern film with excellent dimensional accuracy and intension, no drop-off pattern in developing step and grinding step, high roasting-temperature resistance during forming liquid crystal orientation film and thermal endurance, good durability to the stripping solution of the liquid crystal orientation film and no 'image retention' even in low exposure and no sublimation product in heating step. The ray sensitivity resin combination comprises: (A) polymers comprising at least one group selected from matter group composed of carboxyl group and anhydride group and polymerization unsaturated bond in molecule; (B) monomer with polymerization unsaturated bond; (C) ray sensitivity polymerization initiator; and (D) compound with the structure represented by the formula (1), in formula (1), '*'represents bonding point.

Description

technical field [0001] The present invention relates to radiation-sensitive resin compositions, separators and protective films for liquid crystal display elements, and methods for their formation. Background technique [0002] Among members used in liquid crystal display elements, spacers, protective films, and the like are often formed by photolithography (for example, for spacers, see Patent Document 1). In recent years, due to the popularization and rapid development of large-scale liquid crystal display panels, it is necessary to shorten the irradiation time of radiation and shorten the development time in the photolithography process in terms of cost reduction and process time shortening. [0003] However, if a spacer or a protective film is formed through a low-exposure radiation irradiation process that shortens the irradiation time using a previously known radiation-sensitive resin composition, there will be the following problems: the strength of the resulting patt...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/028G03F7/00G02F1/1339
CPCG03F7/027G03F7/028
Inventor 浜口仁
Owner JSR CORPORATIOON
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