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Display

A display and photosensitive sensor technology, applied in static indicators, instruments, electrical solid devices, etc., can solve problems such as inability to detect and realize functions, and achieve the effects of reducing parasitic capacitance, improving saturation characteristics, and improving detection sensitivity

Inactive Publication Date: 2012-07-18
JAPAN DISPLAY INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, the method of detecting and recognizing the shadow of a finger or stylus under external light has a problem that it cannot function in the dark
On the other hand, the method of reflecting the light of the backlight with a finger or a stylus and detecting the reflected light has the problem that it cannot be detected in the case of a completely black display.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0079] Now, taking a liquid crystal display as an example and referring to the drawings, a display according to a first embodiment of the present invention will be described below.

[0080] The display of this embodiment is preferably applied to a so-called "transmissive type" liquid crystal display in which light is projected from the backside surface side (the surface side on the opposite side to the frontside surface on which an image is displayed). Therefore, the following description is based on the assumption that the liquid crystal display is a transmissive type.

[0081] (overall structure)

[0082] figure 1 It is a schematic diagram of the overall structure of a transmissive liquid crystal display.

[0083] figure 1 The illustrated liquid crystal display 100 has, for example, a liquid crystal panel 200 as a display section as a "substrate" and a backlight 300 as a "illumination section", and a data processing section 400 .

[0084] For example, if figure 1As show...

example 1

[0262] about Figure 5A and 5B The thin film photodiode shown, manufactured the thin film photodiode according to the existing example, wherein the anode region (P + area) the width Wp of 36A and the cathode area (N + Regions) 36K each have a width Wn equal to 100 μm.

[0263] Here, by shorting the anode region (P + area) 36A and the cathode area (N + region) 36K to test the dependence of the gate capacitance Cg on the voltage Vg applied to the control gate viewed from the gate terminal. Here, set in the anode region (P + area) 36A and the cathode area (N + The widths of the I regions 36I between regions) 36K vary to 4.5 μm (a), 5.5 μm (b), 6.5 μm (c), 7.5 μm (d), 8.5 μm (e) and 9.5 μm (f). In this case, the control gate and cathode region (N + region) 36K and the overlap between the control gate and the anode region (P + The overlap between regions) 36A remains unchanged.

[0264] The results of the above tests are as follows Figure 13 shown.

[0265] When a cert...

example 2

[0271] based on Figure 5A and 5B The structure of the thin film photodiode shown, by setting the cathode region (N + area) 36K has a width Wn of 100 μm, while the variable anode area (P + The width Wp of the area) 36A is used to manufacture a thin film photodiode, and the variation of the parasitic capacitance Cp with the width Wp is measured.

[0272] The result is as Figure 15 , where (a) represents the parasitic capacitance viewed from the control gate 38, and (b) represents the parasitic capacitance viewed from the anode region (P + Area) 36A to see the parasitic capacitance.

[0273] It can be seen from the figure that between the control grid 38 and the cathode region (N + region) 36K connected to each other, the parasitic capacitance component seen from the control gate 38 and the anode region (P + Area) 36A view of the parasitic capacitance components are along with the anode area (P + area) 36A decreases in width. Therefore, it was confirmed that reducing th...

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Abstract

A display includes: a substrate having a pixel region and a sensor region in which photo-sensor parts are formed; an illuminating section operative to illuminate the substrate from one surface side of the substrate; a thin film photodiode disposed in the sensor region, having at least a P-type semiconductor region and an N-type semiconductor region, and operative to receive light incident from the other surface side of the substrate; and a metallic film formed on the one surface side of the substrate so as to face the thin film photodiode through an insulator film, operative to restrain lightgenerated from the illuminating section from being directly incident on the thin film photodiode from the one surface side, and fixed to a predetermined potential, wherein in the thin film photodiode, the width of the P-type semiconductor region and the width of the N-type semiconductor region are different from each other.

Description

technical field [0001] The present invention relates to a display including a substrate (display portion) having a pixel region in which pixels are formed and a sensor region in which light receiving elements are formed. More specifically, the present invention relates to a technique for improving light utilization efficiency in a process in which light reflected by an object to be detected that is in contact with or close to a substrate (display portion) is received by a plurality of light receiving elements. Background technique [0002] As display devices for mobile phones, personal digital assistants (PDAs), digital cameras, PC (personal computer) monitors, televisions, etc., there are known liquid crystal displays, organic EL (electroluminescence) displays, display, etc. [0003] Along with the reduction of the thickness of the display, the display has begun to be required to have a variety of functions, that is, in addition to the original function of displaying pictu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/133G02F1/136H01L27/12H01L21/84G06F3/042
CPCG06F3/0304G06F3/0412G06F3/0421
Inventor 池田雅延伊藤良一高间大辅关健太大谷夏树
Owner JAPAN DISPLAY INC
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