157 results about "Capacitive micromachined ultrasonic transducers" patented technology

The present invention provides fluidic devices and systems which have micromachined ultrasonic transducers integrated into microchannels. The ultrasonic transducers generate and receive ultrasonic waves. The transducers can be disposed and operated to measure fluid characteristics such as pressure, density, viscosity, flow rate and can also be used to mix and pump fluids.

Methods are provided for production of pre-collapsed capacitive micro-machined ultrasonic transducers (cMUTs). Methods disclosed generally include the steps of obtaining a nearly completed traditional cMUT structure prior to etching and sealing the membrane, defining holes through the membrane of the cMUT structure for each electrode ring fixed relative to the top face of the membrane, applying a bias voltage across the membrane and substrate of the cMUT structure so as to collapse the areas of the membrane proximate to the holes to or toward the substrate, fixing and sealing the collapsed areas of the membrane to the substrate by applying an encasing layer, and discontinuing or reducing the bias voltage. CMUT assemblies are provided, including packaged assemblies, integrated assemblies with an integrated circuit / chip (e.g., a beam-steering chip) and a cMUT / lens assembly. Advantageous cMUT-based applications utilizing the disclosed pre-collapsed cMUTs are also provided, e.g., ultrasound transducer-based applications, catheter-based applications, needle-based applications and flowmeter applications.

Multiple electrode element capacitive micromachined ultrasonic transducer (“cMUT”) devices and fabrication methods are provided. A cMUT device generally comprises a top electrode disposed within a membrane, a bottom electrode disposed on a substrate, and a cavity between the membrane and the bottom electrode. In a preferred embodiment of the present invention, at least one of the first electrode and the second electrode comprises a plurality of electrode elements. The electrode elements can be positioned and energized to shape the membrane and efficiently transmit and receive ultrasonic energy, such as ultrasonic waves. Other embodiments are also claimed and described.

The embodiments of the present invention provide a CMUT array and method of fabricating the same. The CMUT array has CMUT elements individually or respectively addressable from a backside of a substrate on which the CMUT array is fabricated. In one embodiment, a CMUT array is formed on a front side of a very high conductivity silicon substrate. Through wafer trenches are etched into the substrate from the backside of the substrate to electrically isolate individual CMUT elements formed on the front side of the substrate. Electrodes are formed on the backside of the substrate to individually address the CMUT elements through the substrate.

Asymmetric membrane capacitive micromachined ultrasonic transducer (“cMUT”) devices and fabrication methods are provided. In a preferred embodiment, a cMUT device according to the present invention generally comprises a membrane having asymmetric properties. The membrane can have a varied width across its length so that its ends have different widths. The asymmetric membrane can have varied flex characteristics due to its varied width dimensions. In another preferred embodiment, a cMUT device according to the present invention generally comprises an electrode element having asymmetric properties. The electrode element can have a varied width across its length so that its ends have different widths. The asymmetric electrode element can have different reception and transmission characteristics due to its varied width dimensions. In another preferred embodiment, a mass load positioned along the membrane can alter the mass distribution of the membrane. Other embodiments are also claimed and described.

A one or two-dimensional capacitive micro-machined ultrasonic transducer (CMUT) array with supporting frame is provided. The CMUT array has at least three array elements deposited on a conductive substrate. The invention also has at least one CMUT cell in the array element, a conductive top layer deposited to a top side of the element, and a conductive via disposed within the elements. The via is isolated from the conductive top layer and conducts with the substrate. There are at least two isolation trenches in the conductive substrate, and the trenches are disposed between adjacent vias to conductively isolating the vias. A substrate region between the trenches forms a mechanical support frame. At least one conductive electrode is deposited to a bottom surface of the conductive substrate, where the electrode conducts with the via. The support frame eliminates the need for a carrier wafer in the process steps.