Single electron transistor based on ordered mesoporous and preparation method thereof
A single-electron transistor and mesoporous technology, applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve the problems of disordered arrangement of quantum dots, excessive size of quantum dots, poor isolation performance of quantum dots, etc., to achieve isolation Good performance, improved reliability, and high on/off ratio
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[0033] figure 1 It is a side view of the single-electron transistor based on the ordered mesopore of the present invention. The bottom is the substrate 1, using clean and flat glass, single crystal silicon or aluminum oxide deposited on the surface or oxidized to silicon dioxide, and its thickness h1 is 400um~2mm; the source 2 and drain 3 are prepared on the substrate 1 Surface, the thickness h2 is 5nm-500nm; the ordered mesoporous layer 6 is prepared on the surface of the substrate 1, the thickness h3 is 50nm-500nm, the pore diameter d1 of the ordered mesoporous is 1nm-8nm, and the pores of the ordered mesoporous The wall thickness d2 is 1 nm to 3 nm; the ordered mesoporous layer 6 is assembled with nanoparticles 5, and the size d3 of the nanoparticles 5 is 0.5 nm to 8 nm; the distance between the source 2 and the drain 3 is d4 5nm to 20nm; the insulating layer 7 is on the source 2, the drain 3 and the ordered mesoporous layer 6, and its thickness h4 is 3nm to 30nm; the gate...
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