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Micro-inertial sensor with variable pitch capacitor and method for producing the same

A technology of micro-inertial sensor and spacing, which is applied in chemical instruments and methods, components of TV systems, piezoelectric/electrostrictive/magnetostrictive devices, etc. Increase the mechanical noise of the sensor, the large air damping of the laminated film, etc., to achieve the effect of novel structure, reducing air damping, and improving yield

Inactive Publication Date: 2009-07-15
HAIAN COUNTY SHENLING ELECTRICAL APPLIANCE MFG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For comb-shaped capacitive sensors processed by bulk silicon technology such as Deep Reactive Particle Etching (Deep RIE), the aspect ratio of the plate capacitance is generally less than 30:1, which limits the increase in the mass of the sensor vibrator and the Reduced plate spacing
For small-pitch plate capacitors, the pressure film air damping is relatively large, which increases the mechanical noise of the sensor

Method used

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  • Micro-inertial sensor with variable pitch capacitor and method for producing the same
  • Micro-inertial sensor with variable pitch capacitor and method for producing the same
  • Micro-inertial sensor with variable pitch capacitor and method for producing the same

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Embodiment Construction

[0022] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the present invention is by no means limited to the described embodiments.

[0023] Such as figure 1 , 2 As shown in and 3, a micro-inertial sensor with variable pitch capacitance includes a glass substrate 14, a sensor mass 3, a driver mass 1 and a fixed driving silicon strip 11.

[0024] The sensor mass 3 is a rectangular silicon wafer, and the two corresponding ends of the sensor mass 3 are connected to the sensor anchor point 4 through the sensor U-shaped silicon support beam 2, and the sensor anchor point 4 is fixedly arranged on the glass substrate 14, The sensor mass 3 is arranged in parallel with the glass substrate 14; the other two corresponding ends of the sensor mass 3 are respectively provided with two groups of silicon strip groups, and each group of silicon strip groups includes three silicon strips 6 arranged in parallel, and the mass...

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Abstract

The invention relates to a microinertia sensor of a variable pitch capacitor and a preparation method thereof. The prior product limits the increase in the mass of the sensor vibration generator and the decrease in the polar plate pitch. A sensor mass block is a rectangular silicon chip etched with fence-shaped strips, the two corresponding ends are connected with anchor points by a silicon supporting beam, and the other two corresponding ends are respectively provided with silicon strips with the same quantity and corresponding positions. Driver mass blocks are arranged at the two sides of the sensor mass block, an annular groove is etched in the middle, the two sides are provided with movable driving silicon strips and comb detection silicon strips, and the silicon strips connected with the sensor mass block and the corresponding detection silicon strips form a detection capacitor. The comb strips of the fixed driving silicon strips and the movable driving silicon strips from a driving capacitor. The sensor mass block corresponding to the bottom surface of the glass underlay is provided with interdigital aluminum electrodes, and each fence-shaped strip of the sensor mass block corresponds to each pair of interdigitals in the interdigital aluminum electrodes. The invention has simple technique, and contributes to lowering cost and improving rate of finished products.

Description

technical field [0001] The invention belongs to the technical field of micro-electronic machinery, relates to a micro-inertial sensor, in particular to a high-precision micro-inertial sensor with grid-shaped bar capacitors and small-damping variable-spacing capacitors and a manufacturing method thereof. Background technique [0002] In recent ten years, accelerometers made with micromechanical technology have been developed rapidly. Its main acceleration detection technologies include piezoresistive detection, piezoelectric detection, thermal detection, resonance detection, electromagnetic detection, light detection, tunnel current detection and capacitance detection. In addition, there are accelerometers based on other detection technologies, such as optical accelerometers, electromagnetic accelerometers, and capacitive accelerometers. The development of optical accelerometers is mainly to combine the advantages of light and micromechanics to make sensors with high electro...

Claims

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Application Information

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IPC IPC(8): B81C5/00B81B7/02B81C1/00G01P15/125B81C99/00
Inventor 董林玺颜海霞孙玲玲
Owner HAIAN COUNTY SHENLING ELECTRICAL APPLIANCE MFG
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