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Compositions, methods and systems for polishing aluminum oxide and aluminum oxynitride substrates

A technology for compositions and substrates, applied in polishing compositions, polishing compositions containing abrasives, chemical instruments and methods, etc., and can solve problems such as damage

Inactive Publication Date: 2009-07-29
CABOT MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, high abrasive content can lead to damaging levels of heat from friction, which can negatively impact polishing pads used to polish alumina and / or aluminum oxynitride substrates

Method used

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  • Compositions, methods and systems for polishing aluminum oxide and aluminum oxynitride substrates
  • Compositions, methods and systems for polishing aluminum oxide and aluminum oxynitride substrates
  • Compositions, methods and systems for polishing aluminum oxide and aluminum oxynitride substrates

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] A 2.5 g aliquot of the 40% phosphoric acid solution was added to 997 g deionized water with stirring. To this solution was added 1000 g of colloidal silica (40% solids, average particle size about 110 nm) with stirring. The pH was adjusted to 2.0 with 10% HCl solution. The resulting solution contained a final phosphoric acid concentration of 0.05%.

Embodiment 2

[0035] A control slurry was prepared as described in Example 1 except that the phosphoric acid was omitted. Adjust the pH to 2.3.

Embodiment 3

[0037] A 1.40 g aliquot of the 100% phosphonoacetic acid solution was added to 998 g deionized water with stirring. To this solution was added 1000 g of colloidal silica (40% solids, average particle size about 110 nm) with stirring. The pH was adjusted to 2.17 with 10% HCl solution. The resulting solution contained a final phosphonoacetic acid concentration of 0.07%.

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Abstract

A method and system is provided for improved polishing or planarizipg of aluminum oxide and / or aluminum oxyrptride substrates. Specifically, the composition comprises an abrasive, a liquid carrier, and a phosphorus-type mono-acid. Preferably, the phosphorus-type mono-acid is phosphoric acid, phosphonoacetic acid, phosphorous acid, methyl phosphonic acid, or mixtures thereof. The control of the pH of the composition further improves polishing rates.

Description

technical field [0001] The present invention relates to compositions and methods for polishing substrates. More specifically, the present invention further relates to methods and systems for chemical mechanical polishing of aluminum oxide or aluminum oxynitride surfaces. Background technique [0002] Alumina (Al 2 o 3 ) substrates (such as sapphire substrates) and aluminum oxynitride substrates are generally suitable for many applications, such as commercial, industrial, scientific and military applications. These substrates are typically very strong and transparent materials, making them useful in window, substrate and dome applications. In addition, aluminum oxide and aluminum oxynitride are resistant to very high temperatures, making them particularly useful in electronic applications where high heat is generated. [0003] One electronic application of aluminum oxide and / or aluminum oxynitride is as a crystal in laser applications. In particular, sapphire crystals wi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B37/00H01L21/304C09G1/00
CPCC09G1/02B24B37/044C09K3/1409B24B37/0056C09K3/1463B24D3/00C23F1/16C23F3/06H01L21/304
Inventor 凯文·莫根伯格穆克什·德赛
Owner CABOT MICROELECTRONICS CORP
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