20 results about "Methylphosphonic acid" patented technology

The invention discloses a high-safety lithium ion battery electrolyte and a lithium ion battery prepared from the high-safety lithium ion battery electrolyte, and belongs to the technical field of lithium ion batteries. An additive O, O-diethyl (3-ethoxythiophene-2-yl) methylphosphonate is added during preparation of the lithium ion battery electrolyte, so that the high-safety lithium ion battery electrolyte is prepared; a cross-linking reaction or a polymerization reaction can be carried out under a high-temperature condition to form a carbonaceous protective layer, cooling is realized through an endothermic reaction in the forming process of the carbonaceous protective layer, and active substances in the battery are isolated after the carbonaceous protective layer is formed; the battery safety problem caused by higher heat production and higher battery combustion risk when the lithium ion battery is used for a large-scale energy storage system is solved.

The invention discloses a preparation method and application of a triazole phosphate type corrosion and scale inhibitor, and relates to the technical field of industrial water treatment chemicals. The compound is prepared by a three-step synthesis method which comprises the following steps: firstly, preparing an amino methylene phosphonic acid compound with one-NH reaction site from n ethylene (n + 1) amine, phosphorous acid and formaldehyde; secondly, preparing a triazole derivative from ethylene glycol glycidyl ether and triazole; and reacting the two products with sodium bicarbonate to obtain a target product. The target molecule contains a sodium phosphate group and a triazole group at the same time, through the synergistic effect of functional groups, intramolecular synergy of scale inhibition and corrosion inhibition functions is achieved, and the corrosion inhibition performance higher than that of a DETPMP scale and corrosion inhibitor used commercially is shown. The triazole phosphate type corrosion and scale inhibitor has good catalytic activity on photocatalytic carbon dioxide reduction under the conditions of room temperature and high temperature, the TON (carbon monoxide conversion number) can reach 1206, and the selectivity is 100%.

The application discloses an amplification preparation method of dimethylheptyl methylphosphonate, and belongs to the technical field of medical intermediates. The core point of the application is that 2-octanol and phosphorus trichloride are used as raw materials, and tri-2-octyl phosphite is generated in an organic solvent in the presence of a catalyst A, then the tri-2-octyl phosphite is reacted with a methylating agent in the presence of a catalyst B to generate dimethylheptyl methylphosphonate. The method avoids the use of dangerous reagents and expensive reagents, reduces the raw material cost, reduces the generation amount of isomers, improves the reaction yield, greatly reduces the amount of three wastes, and makes the whole preparation process more green and environment-friendly. The process is simple and reliable, easy to industrial production, and provides a new reaction path for the synthesis of dimethylheptyl methylphosphonate.

The invention provides a herbicide composition, a herbicide as well as a preparation method and application of the herbicide, and belongs to the technical field of agricultural herbicides. The composition provided by the invention comprises (1-hydroxypropane-1, 3-diyl) bis (methylphosphonic acid) and glufosinate-ammonium, and the weight ratio of the (1-hydroxypropane-1, 3-diyl) bis (methylphosphonic acid) to the glufosinate-ammonium is 20: 1-50: 1. The composition can be used for controlling weeds, especially weeds which have resistance to glufosinate-ammonium. The (1-hydroxypropane-1, 3-diyl) bis (methylphosphonic acid) and glufosinate-ammonium are compounded, a remarkable synergistic effect is shown, the prevention and treatment effect of glufosinate-ammonium is improved, the increasingly prominent resistance problem in use of a single glufosinate-ammonium agent can be effectively solved, and the weeding composition can be widely applied to the technical field of agricultural weeding.

This invention relates to the field of ceramic materials, specifically disclosing a high water-resistant magnesium phosphate cement-based foam ceramic and its preparation method. The foam ceramic comprises the following components: 100-150 parts magnesium phosphate cement, 1-5 parts retarder, 5-20 parts foaming agent, 1-5 parts foam stabilizer, 5-15 parts lutetium ion source, 1-8 parts methylene phosphonic acid component, and 30-60 parts water. The method includes: (1) mixing the lutetium ion source, methylene phosphonic acid component, and water to obtain a complex solution. (2) mixing the magnesium phosphate cement and foam stabilizer, then adding the complex solution to the mixture and mixing to obtain a slurry. (3) adding the foaming agent to the slurry and allowing it to stand for foaming, followed by curing to obtain the foam ceramic. This invention not only effectively reduces the solubility of magnesium phosphate cement hydration products, but also combines CO2 foaming to generate a low-solubility magnesium carbonate shell, significantly improving the long-term stability of the foam ceramic in an aquatic environment while maintaining high porosity.

Organometallic precursor solutions containing one or more phosphonate, such as methylphosphonic acid, tert-butylphosphonic acid, diethoxyalyllphosphonate, benzylphosphonic acid, and phenylphosphonic acid, are described. Corresponding methods for forming radiation patternable coatings as well as methods for forming a pattern using a solventless developing process are also described. The incorporation of a phosphonate into an organometallic photoresist composition, such as an organotin photoresist composition, is described as a way to increase stability of organometallic precursor solutions, to improve the homogeneity of organometallic photoresist films, and / or to improve the patterning performance of organometallic photoresist coatings.

Compounds of the Formula (I), pharmaceutical compositions comprising compounds of the Formula (I), and their use for treating or preventing cancer: (I)

The application provides a preparation method of 4-(hydroxymethyl phosphono)-2-carbonyl butyric acid, comprising the following steps: a) mixing methyl phosphonate diester, carboxylic acid and acryloyl cyanide to perform an addition reaction, and obtaining (3-cyano-3-carbonyl propyl) methyl phosphonate liquor after reduced pressure distillation; b) uniformly mixing the (3-cyano-3-carbonyl propyl) methyl phosphonate liquor obtained in step a) with water, cooling to 10-40 DEG C, then adding hydrochloric acid dropwise to perform acidification, continuing to stir for 0.1-1 h after the dropwise addition is completed, then performing a hydrolysis reaction, and finally performing purification treatment to obtain 4-(hydroxymethyl phosphono)-2-carbonyl butyric acid. Compared with the prior art, the preparation method provided by the application does not need to perform a cyanation reaction, avoids the use of high-cost, hard-to-obtain cyclic phosphonic anhydride and the highly toxic sodium cyanide; and the preparation method has short process steps, the raw materials are widely sourced and low in cost, the reaction conditions are mild, and the element comprehensive utilization rate is high.

The invention relates to the technical field of high polymer materials, in particular to a high-temperature-resistant polymer material composition and application thereof. The composition comprises monomers such as polyethylene glycol (200) dimethacrylate, isobornyl acrylate and the like, Sadama UV (Ultraviolet) resin, a photoinitiator TPO (Thermoplastic Polyolefin) and a core functional molecule ((2-(5, 5, 5-trifluoro-1-methacrylamidopent-2-yl)-1H-benzo [d] imidazole-1-yl) methyl) phosphonic acid. The core functional molecules are prepared step by step through condensation cyclization, Michael addition, Mannich reaction, catalytic hydrogenation acylation and acidic hydrolysis, the composition and a main matrix material are mixed, a polymer microcrystalline layer with the thickness of 20 microns is formed through UV curing, and then the 3MDT dimming film is prepared. The film has excellent high-temperature-resistant stability, strong interface adhesion, rapid dimming response and good mechanical properties, can keep a stable dimming effect in a high-temperature environment, and is suitable for high-end scenes such as buildings and automobiles.

The application provides a kind of F-free one-dose low IGZO damage metal etching solution and preparation method thereof, and relates to the technical field of semiconductor display panel manufacturing.The F-free one-dose low IGZO damage metal etching solution is composed of the following raw materials: hydrogen peroxide, complexing agent, 2,4-dichlorophenoxyacetic acid, ethylenediaminetetraacetic acid, corrosion inhibitor compound, and ultra-pure water is added to make up the volume;the corrosion inhibitor compound is obtained by mixing 2-mercapto-5-methylbenzimidazole and aminotrimethyl phosphonic acid in a mass ratio of 1:2-3, and the ratio of the addition amount of ethylenediaminetetraacetic acid to the corrosion inhibitor compound is ≤1.2.The application uses a complexing agent-corrosion inhibitor compound synergistic system, the IGZO layer damage rate is <5%, which significantly improves the device yield, and the Cu etching rate is 500-800 Å / min, the MoTi etching rate is 300-500 Å / min, and the rate matching is good.

A method of preparing an aluminum methyl methylphosphonate (AMMP) flame retardant by reacting at a reaction temperature of about 110 °C or higher for an amount of time sufficient to produce the AMMP, a reaction mixture containing an aqueous aluminum- containing methylphosphonic acid solution; and dimethyl methylphosphonate. The resulting product is intumescent.

The present application relates to wastewater treatment technical field, specifically to a kind of PVDF separation membrane and integrated process for treating printing and dyeing wastewater.The method adopts six-step process:1) PVDF microporous membrane pretreatment and pore adjustment;2) polydopamine primer preparation;3) alternatively depositing sodium polystyrene sulfonate and zirconium oxychloride octahydrate;4) aminomethyl phosphonic acid graft modification;5) UiO-66-NH2 type MOF epitaxial growth, and insert repair treatment strengthen interlayer coordination anchoring;6) stabilization treatment, enhance structural compactness.The membrane shows excellent removal performance to multi-sulfonic acid group anionic dyes, still maintains higher removal rate and flux recovery rate under high salt, complex working condition, effectively solves the problem of structural relaxation and selective removal of traditional PVDF membrane in high salt environment, and has good industrial application prospect.

This invention provides a method for preparing 4-(hydroxymethylphosphono)-2-carbonylbutyric acid, comprising the following steps: a) mixing methylphosphonite diester, carboxylic acid, and acryloyl chloride, performing an addition reaction, and distilling under reduced pressure to obtain a (3-chloro-3-carbonylpropyl)methylphosphonate solution; b) mixing the (3-chloro-3-carbonylpropyl)methylphosphonate solution obtained in step a) with sodium cyanide, solvent, and catalyst, performing a substitution reaction, and purifying to obtain a (3-cyano-3-carbonylpropyl)methylphosphonate solution; c) mixing the (3-cyano-3-carbonylpropyl)methylphosphonate solution obtained in step b) with water, cooling to 10℃~40℃, adding hydrochloric acid dropwise for acidification, stirring for 0.1h~1h after the addition is complete, then performing a hydrolysis reaction, and finally purifying to obtain 4-(hydroxymethylphosphono)-2-carbonylbutyric acid. Compared with existing technologies, the preparation method provided by this invention has simple process steps, mild reaction conditions, and high comprehensive utilization rate of elements.

This invention relates to an aminomethylphosphonic acid aminoguanidine nonlinear optical crystal, its preparation method, and its uses. The crystal has the molecular formula (CN4OH7)(CH2NH3PO3), a molecular weight of 203.15, belongs to the orthorhombic crystal system, and has a space group of [missing information]. P 212121, cell parameters are a =6.276(2)Å, b =10.239(4)Å, c =13.868(4)Å, α =90.00° β =90.00° c =90.00° Z =4, V =891.2(5)Å 3 Centimeter-sized crystals were grown using evaporation, aqueous solution cooling, or hydrothermal methods. The ultraviolet absorption edge of these crystals is shorter than 200 nm, and the experimental birefringence is approximately 0.15 at 546 nm. This crystal preparation method is simple and low-cost, exhibiting significant nonlinear optical effects, a large birefringence, a wide transmission range, and ease of growth and processing. It can be used as an ultraviolet nonlinear optical crystal and a birefringent crystal.

The invention relates to the technical field of solid waste treatment, in particular to a method for recycling metal lithium from a waste lithium battery material. The method comprises three core steps of leaching, adsorption and desorption precipitation: firstly, leaching LFP positive electrode powder by adopting a mixed leaching agent of dilute sulphuric acid and hydrogen peroxide; li < + > in the leachate is directionally adsorbed in a fixed bed through a specific modified resin adsorbent; and finally, analyzing, depositing lithium and the like to obtain the battery-grade lithium carbonate. Wherein the modified resin adsorbent is prepared from acrylonitrile and dimethylaminoethyl methacrylate through crosslinking copolymerization, nitrile group conversion and methylphosphonic acid group grafting modification, and PO4 < 3-> interference can be efficiently resisted. The method solves the problems of high acid consumption, poor adsorption selectivity, low lithium recovery rate and the like in the prior art, and has remarkable economic and environment-friendly values.

Organometallic precursor solutions containing one or more phosphonate, such as methylphosphonic acid, tert-butylphosphonic acid, diethoxyalyllphosphonate, benzylphosphonic acid, and phenylphosphonic acid, are described. Corresponding methods for forming radiation patternable coatings as well as methods for forming a pattern using a solventless developing process are also described. The incorporation of a phosphonate into an organometallic photoresist composition, such as an organotin photoresist composition, is described as a way to increase stability of organometallic precursor solutions, to improve the homogeneity of organometallic photoresist films, and / or to improve the patterning performance of organometallic photoresist coatings.

This invention discloses a biodegradable packaging material and its preparation method, relating to the field of packaging materials. In preparing the biodegradable packaging material, vermiculite powder is grafted with chloromethyltrimethoxysilane and then reacted with piperazine, bis(2-chloroethyl)methylphosphonate, and ethylenediamine to obtain modified vermiculite powder; corn starch is oxidized with sodium periodate to obtain modified corn starch; polyvinyl alcohol, allyltrimethylammonium chloride, and 5-allylmercapto-[1,3,4]thiadiazole-2-amine are reacted to obtain modified polyvinyl alcohol; and modified corn starch, glycerol, modified polyvinyl alcohol, modified vermiculite powder, and zinc chloride are mixed to obtain the biodegradable packaging material. The biodegradable packaging material prepared by this invention exhibits excellent flame retardancy, antibacterial properties, mechanical properties, and rapid degradation.

The invention provides an F-free one-dosage type low IGZO damage metal etching solution and a preparation method thereof, and relates to the technical field of semiconductor display panel manufacturing. The F-free one-dosage form low IGZO damage metal etching liquid is prepared from the following raw materials: hydrogen peroxide, a complexing agent, 2, 4-dichlorphenoxyacetic acid, ethylenediamine tetraacetic acid, a corrosion inhibition compound agent and the balance of ultrapure water, the corrosion inhibition compound agent is obtained by mixing 2-mercapto-5-methylbenzimidazole and amino trimethylphosphonic acid according to the mass ratio of 1: (2-3), and the ratio of the addition amount of the ethylenediamine tetraacetic acid to the addition amount of the corrosion inhibition compound agent is smaller than or equal to 1.2. According to the method, a complexing agent-corrosion inhibition compound synergistic system is adopted, the damage rate of an IGZO layer is smaller than 5%, the device yield is remarkably increased, the etching rate of Cu is 500-800 / min, the etching rate of MoTi is 300-500 / min, and the rate matching performance is good.

According to the method, halogenated difluoromethyl phosphonate is used as a fluorinating agent to replace traditional Freon, raw materials are easier to obtain, the process is clean, and the reaction process is safe and environmentally friendly; the process is simple and convenient to operate, the product is easy to separate, the post-treatment is simple and extensive, the yield is high, the method is suitable for large-scale production, and a new route is provided for synthesis of the pyroxasulfone intermediate.