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Balancing and positioning system for workpiece platform of photoetching machine

A technology of positioning system and lithography machine, which is applied in the field of semiconductor manufacturing, can solve the problems such as the difficulty of balancing the system control and increasing the complexity of the balancing and positioning system of the workpiece table, and achieve the effects of reducing the difficulty of vibration reduction, reducing the impact force and improving the positioning accuracy

Active Publication Date: 2009-11-04
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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AI Technical Summary

Problems solved by technology

The disadvantage of this prior art is that in order to balance the reaction moment, the auxiliary balance mass system is added, and in order to compensate the drift of the balance mass system along the X, Y and Rz directions, the balance positioning system adds two mechanical arms, which increases the work table. The complexity of the balance positioning system brings difficulty to the control of the balance system

Method used

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  • Balancing and positioning system for workpiece platform of photoetching machine
  • Balancing and positioning system for workpiece platform of photoetching machine
  • Balancing and positioning system for workpiece platform of photoetching machine

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Embodiment Construction

[0025] Below, the present invention will be further described in conjunction with the accompanying drawings.

[0026] First, please refer to figure 1 , figure 1 It is a schematic structural view of the torque canceller of the present invention. As can be seen from the figure, the torque canceller 104 provided by the present invention includes a torque canceller base 401; a torque canceller motor rotor 402 is rigidly connected to the torque canceller base 401 The moment eliminator balance mass 403 is connected to the moment eliminator base 401 through a vertical air bearing and a lateral air bearing, wherein a magnet is housed in the moment eliminator balance mass 403. The technical effect of the canceller 104 is described in detail.

[0027] Then please refer to figure 2 , figure 2 It is a structural schematic diagram of the balanced positioning system of the lithography machine workpiece table of the present invention. In order to explain concisely and accurately, first...

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Abstract

The invention provides a balancing and positioning system for a workpiece platform of a photoetching machine, which comprises a photoetching machine frame, a pedestal, a first compensation module, a first balancing mass block, two second compensation modules, a second balancing mass block, two second motor stators, two second motor rotors, a first motor stator and at least one force moment eliminator which is arranged on the side edge of the pedestal. The balancing and positioning system eliminates the reaction force moment of an exposure platform generated under the condition of acceleration through the force moment eliminator, and greatly reduces the impact force on the pedestal when the workpiece platform system carries loads under the condition of acceleration.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, and in particular to a balanced positioning system for a workpiece table of a lithography machine. Background technique [0002] The photolithography apparatus in the prior art is mainly used in the manufacture of integrated circuits (ICs) or other micro devices. With a photolithographic apparatus, multilayer masks with different mask patterns are sequentially imaged in precise alignment on a photoresist-coated wafer, such as a semiconductor wafer or an LCD panel. Lithography devices are generally divided into two categories: one is a stepper lithography device, the mask pattern is exposed and imaged on one exposure area of ​​the wafer, and then the wafer moves relative to the mask to move the next exposure area to the mask pattern And under the projection objective lens, the mask pattern is exposed on another exposure area of ​​the wafer again, and this process is repeated until all e...

Claims

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Application Information

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IPC IPC(8): G03F7/20F16F15/02F16F15/28
Inventor 江旭初齐芊枫郑椰琴
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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