Process for producing molybdenum-based sputtering target plate

A manufacturing method and sputtering target technology, applied in sputtering plating, ion implantation plating, coating and other directions, can solve problems such as reducing deformation resistance, and achieve the effect of suppressing edge fracture and efficient manufacturing

Inactive Publication Date: 2009-12-23
NIPPON STEEL MATERIALS CO LTD
View PDF5 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the manufacturing method of the Mo-based target plate by the rolling method, it has not been proposed to further reduce the deformation resistance or suppress the occurrence of cracks or defects by combining the concentration of trace elements, crystal grain size conditions, and rolling conditions. means of increasing productivity

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Process for producing molybdenum-based sputtering target plate
  • Process for producing molybdenum-based sputtering target plate
  • Process for producing molybdenum-based sputtering target plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0073] Using pure Mo powder with an average particle size of 5 μm as a starting material, a manufacturing experiment using a rolled Mo target plate was carried out. The Mo powder is cold-rolled to produce a temporary molded body with a relative density of about 60%. Then, after inserting the temporary molded body into a HIP container made of SS400, the work of controlling the oxygen content was performed. 1500 mass ppm of oxygen was attached to the raw material powder, and after the inside of the container was evacuated, hydrogen was purged and heated to 300°C to reduce the oxygen concentration. The longer the holding time is, the more the oxygen concentration decreases. Therefore, the oxygen concentration is controlled by the holding time, and the oxygen concentration is represented by the oxygen concentration measured in the Mo ingot after pressure sintering. The oxygen concentration was measured inside the ingot surface at a distance of 100 μm or more.

[0074] After per...

Embodiment 2

[0101] A plurality of Mo ingot plates were produced under the same production conditions as in the invention example of No. 7 of Example 1, and an experiment for confirming the effect of reheating during rolling was implemented. The oxygen concentration contained in this Mo ingot was 200 mass ppm. This oxygen concentration is a value measured inside the surface at a distance of 100 μm or more. In addition, the average crystal grain size of these ingots measured by the line segment method was 19 μm. The size of the Mo ingot was 220 mm wide x 1400 mm long x 30 mm thick.

[0102] First, the Mo ingot was reheated at each temperature between 1000°C and 1300°C, and kept for 1 hour. Reheating was performed in the atmosphere using an electric furnace. In order to study the compression deformation resistance of each ingot after reheating, a small test piece was cut out from the ingot after reheating, and the S-S curve during compression was measured at the same temperature as the ro...

Embodiment 3

[0122] An experiment of producing a Mo-based sputtering target plate was carried out by rolling a Mo-based ingot made of an element having a mass ratio of Mo:W=80:20.

[0123] The starting materials are pure Mo powder with an average particle size of 5 μm and pure W powder with an average particle size of 8 μm. These are well stirred with a ball mill to prepare mixed powder. The mixed powder is molded by cold isostatic pressing to produce a temporary molded body with a relative density of about 60%. In addition, the temporary molded body was inserted into a HIP container made of SS41, and the oxygen content was controlled. The oxygen concentration of the mixed powder was 3 mass ppm, and the inside of the container was directly heated to 300° C. in an air state to oxidize it. The longer the retention time, the more the oxygen concentration increases. Here, the oxygen concentration is controlled by the holding time, and the oxygen concentration is represented by the oxygen conc...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
crystal sizeaaaaaaaaaa
particle diameteraaaaaaaaaa
particle sizeaaaaaaaaaa
Login to view more

Abstract

The present invention provide a process for efficiently producing a molybdenum-based target plate having a large area in a high yield by combining a requirement concerning the content of a trace element with conditions for rolling to thereby reduce deformation resistance and inhibit the occurrence of cracks such as edge cracks. The process, which is for producing a molybdenum-based sputtering target plate by rolling a molybdenum-based ingot, is characterized by comprising a step in which a molybdenum-based ingot is produced while regulating the oxygen concentration therein to 10 to 1,000 mass ppm and a step in which the molybdenum-based ingot is heated and rolled at a rolling temperature of 600-950 DEG C.

Description

technical field [0001] The present invention relates to Mo-based raw materials used as electrode materials such as liquid crystals, etc., and particularly relates to a method for producing a Mo-based sputtering target plate. Background technique [0002] Mo-based alloys are gradually being used as electrode materials for liquid crystals and the like. When forming electrodes, due to the application of the sputtering method, Mo-based target plates for sputtering are gradually becoming necessary. In particular, along with the increase in the area of ​​liquid crystals, the increase in the area of ​​the target material is required, and an attempt has been made to manufacture a Mo-based target plate with a large area by rolling a Mo-based ingot into a base material. [0003] Non-Patent Document 1 describes a technique in which rolled sheets can be produced by hot rolling at 1200 to 1370° C. by repeating heating at 1150 to 1320° C. after extrusion as Mo rolling. [0004] Patent D...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34B22F3/15B22F3/24C22F1/18C22F1/00C22C27/04
CPCC22C27/04B22F2998/10C22F1/18C22C1/045C23C14/3414B22F9/04B22F3/04B22F3/15C22F1/00C23C14/34
Inventor 稻熊彻坂本广明大石忠美泉真吾中村元
Owner NIPPON STEEL MATERIALS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap