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Laser device with long depth of focus

A technology of laser device and depth of focus, which is applied in the direction of exposure device, optics, optical components, etc. of photoengraving process, can solve the problems of reducing light utilization efficiency and increasing cost, and achieves a simple structure, low manufacturing cost and high light utilization efficiency. Effect

Inactive Publication Date: 2010-01-06
FOXSEMICON INTEGRATED TECHNOLOGY (SHANGHAI) INC +1
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Problems solved by technology

However, this technology requires broadband laser or multi-wavelength laser, resulting in high cost
In addition, Diffractive Optical Flement (DOE) can also be used to extend the depth of focus, but this technology still requires broadband laser or multi-wavelength laser, and the high-order diffraction of the beam reduces the light utilization efficiency

Method used

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  • Laser device with long depth of focus
  • Laser device with long depth of focus
  • Laser device with long depth of focus

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Embodiment Construction

[0012] The present invention will be further described in detail below in conjunction with the accompanying drawings.

[0013] See figure 1 , the laser device 10 provided by the first embodiment of the present invention includes a laser source 11 and an optical module 12 .

[0014] The laser source 11 is used to emit single-wavelength ultraviolet light 101 .

[0015] The optical module 12 is a lens, which is arranged on the optical path of the single-wavelength ultraviolet light 101 . The optical module 12 has a first surface 121 adjacent to the laser source 11 , and a second surface 122 opposite to the first surface 121 . The first surface 121 is an aspherical surface defined by a conic constant or aspheric coefficients. The second surface 122 is a plane. The single-wavelength ultraviolet light 101 emitted by the laser source 11 is transmitted through the first surface 121 of the optical module 12 and then converged onto the image plane 13 to form a light spot 131 .

[0...

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Abstract

The invention relates to a laser device with long depth of focus, comprising a laser source and an optical module, wherein the laser source is used for emitting single wavelength ultraviolet light. The optical module comprises a first optical element arranged on the light path of the single wavelength ultraviolet light, the first optical element is provided with a first surface which is adjacent to the laser source and a second surface which corresponds to the first surface, and at least one of the first surface and the second surface is an aspheric surface and is used for focusing the single wavelength ultraviolet light on one point.

Description

technical field [0001] The invention relates to a laser device, especially a laser device with a long focal depth. Background technique [0002] With the advancement of semiconductor technology and processing technology, various electronic components and optical components are increasingly miniaturized. Lithography in semiconductor technology, or laser processing in processing technology, have begun to use short-wavelength ultraviolet laser devices (UV Laser) to make the feature size (Feature size) and resolution of electronic components or optical components Resolution meets the requirements. Since the resolution R is inversely proportional to λ / NA (λ is the laser wavelength and NA is the numerical aperture), the DOF (Depth of Focus) is proportional to λ / NA 2 , here it can be understood that the effective depth of laser action is proportional to λ / NA 2 , so as the resolution (as assessed by the laser spot size) increases, the depth of focus decreases. A decrease in the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/09G02B17/08G03F7/20
CPCG02B27/0075
Inventor 韦安琪陈志隆
Owner FOXSEMICON INTEGRATED TECHNOLOGY (SHANGHAI) INC
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