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Broad-spectrum white-light LED structure and growing method

A technology of LED structure and growth method, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., and can solve the problems of few research results

Inactive Publication Date: 2010-05-26
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] The method of realizing multi-level emission in the III-V nitride semiconductor structure, due to the limitation of material growth technology and material physical property research level in the past, there are few research results in this area

Method used

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  • Broad-spectrum white-light LED structure and growing method
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  • Broad-spectrum white-light LED structure and growing method

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Embodiment Construction

[0039] The present invention adopts a three-color GaN-based white light LED structure, uses MOCVD growth system, uses sapphire or silicon material as a substrate, first processes the substrate and uses a buffer layer to synthesize and grow GaN buffer layer materials, N-type GaN materials, etc. Color GaN / InGaN quantum well materials and P-type GaN materials form a natural light wide-spectrum white light-emitting diode structure. Among them, the three-color quantum wells are respectively: In in the blue light quantum well x Ga 1-x The In component of the N material controls the component x between 0.1 and 0.3 through temperature or TMIn flow rate to ensure that the luminous wavelength is between 400nm and 500nm for blue light; In the green light quantum well material x Ga 1-x The In component of the N material is controlled by the temperature or the flow rate of TMIn, and the component x is between 0.15 and 0.35 to ensure that the luminous wavelength is between 500nm and 580nm...

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Abstract

The invention provides a broad-spectrum white-light LED structure. A GaN buffer layer and a GaN support layer are arranged on a sapphire substrate or a silicon substrate, wherein the thickness of the GaN support layer is over 50 to 2,000nm; and the thickness of an N type GaN is 20 to 1,000nm, and the concentration of the N type GaN is 5*1,018cm-1. A blue light wavelength quantum well material, a blue-green or green quantum well material and a reddish yellow light or red light quantum well material are sequentially grown on the N type GaN, wherein a blue light quantum well is of an InxGa1-xN / GaN multi-quantum well structure of 1 to 10 periods, which is 2 to 20nm and 4 to 25nm thick respectively, and the x is between 0.1 and 0.18; the green light quantum well is of the InxGa1-xN / GaN multi-quantum well structure of 1 to 10 periods, which is 2 to 20nm and 4 to 25nm thick respectively, and the x is between 0.18 and 0.32; and the reddish yellow light or red light quantum well is of the InxGa1-xN / GaN multi-quantum well structure of 1 to 10 periods, which is 2 to 20nm and 4 to 25nm thick respectively, and the x is over 0.32. A three-color GaN substrate white-light LED structure is obtained by the invention.

Description

technical field [0001] The invention relates to a novel method for synthesizing and growing a wide-spectrum white LED structural material and device preparation, in particular to a method for growing a broad-spectrum white LED structural material on a sapphire substrate by using metal organic chemical vapor phase epitaxy MOCVD technology. Background technique [0002] Since Nakamura et al. of Nichia Corporation successfully developed GaN-based blue light-emitting diodes (LEDs) in 1991, research on III-nitride semiconductor materials and devices has developed rapidly. High-efficiency short-wavelength LEDs and lasers have been successfully developed [1,2]. The InGaN-based multiple quantum well (MQWs) structure is the core structure of all these devices. In-depth research and mastery of the optoelectronic properties of InGaN-based MQWs plays an important role in improving device performance. In InGaN-based MQWs, the localization of carriers has been widely studied, and it is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/08
Inventor 张荣谢自力刘斌修向前华雪梅赵红傅德颐陈鹏韩平施毅郑有炓
Owner NANJING UNIV
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