Physical structure regulating method of high-yield soil for summer corns
A technology of physical structure and summer corn, applied in botany equipment and methods, soil preparation methods, horticulture, etc., can solve the lack of quantitative description of cultivation depth and soil physical indicators, affect the sustainable development of national food security, and the ability to accept natural precipitation reduce problems such as increasing water storage and fertilizer retention capacity, increasing crop yield and benefit, and reducing surface runoff
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0013] The present inventor adopts the method of the present invention to carry out the test for many years in Henan Agricultural University science and education park, adopts micro-area simulation test, artificially simulates the suitable soil bulk density of each layer after deep plowing or deep loosening, that is, the 0-20cm soil layer bulk density is designed to be 1.2g / cm 3 , the bulk density of 20-40cm soil layer is designed to be 1.3g / cm 3 . When sowing corn, it is required to sow in wide and narrow rows, the spacing between wide rows is 75cm, and the spacing between narrow rows is 45cm. After emergence, at the jointing stage, combined with fertilization, intertillage and ridges are carried out. Ditching is carried out in the wide rows of corn, and narrow rows are ridged with soil. The ridge height is 20cm. 45cm wide. The bulk density design is close to the actual field (control) 1.2g / cm 3 (0-20cm) and 1.6g / cm 3 (20-40cm) carry out comparative test, the beneficial ...
Embodiment 2
[0034] Adopt method of the present invention to carry out field test in the experiment field of Institute of Agricultural Sciences, Jun County, Henan Province:
[0035] Experimental group: Before sowing the previous crop of summer corn, the soil was plowed deeply, the plowing depth was 30cm, so that the bulk density of the 0-20cm soil plow layer was 1.2g / cm 3 , 20-30cm soil plow layer bulk density 1.3-1.4g / cm 3 , with 15 kg of urea per mu. When sowing corn, it is required to sow in wide and narrow rows, the spacing between wide rows is 70cm, and the spacing between narrow rows is 40cm. At the jointing stage after emergence, 7Kg / mu of N fertilizer is applied at the seedling stage. Ridge, ridge height 15cm, ridge width 40cm.
[0036] Control group: Before sowing the previous crop of summer corn, the soil was plowed to a depth of 20 cm, and 15 kg of urea was applied per mu. When sowing corn, it is required to sow in wide and narrow rows, the distance between wide rows is 70cm,...
Embodiment 3
[0039] Adopt method of the present invention to carry out field test in Chencao Township, Xuchang County, Henan Province:
[0040] Experimental group: Before sowing the previous crop of summer corn, the soil was deeply plowed to a depth of 35cm, so that the bulk density of the 0-20cm soil plow layer was 1.3g / cm 3 , 20-40cm soil plow layer bulk density 1.3-1.4g / cm3 , 15 kg of urea per mu. When sowing corn, it is required to sow in wide and narrow rows, with a spacing of 75 cm between wide rows and a spacing of 45 cm between narrow rows. After emergence, intertillage and ridges should be carried out at the jointing stage. Ditching should be done in the wide rows of corn, and ridges should be raised in narrow rows. The ridge height is 18 cm and the ridge width is 45 cm.
[0041] Control group: Before sowing the previous crop of summer corn, the soil was plowed to a depth of 20 cm, and 15 kg of urea was applied per mu. When sowing corn, it is required to sow in wide and narrow ro...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com