Method for preparing ultrathin diamond carbon film
A technology of diamond-like film and diamond, which is applied in the field of preparation of ultra-thin diamond-like carbon film, can solve the problems that it is difficult to prepare a continuous and dense protective film, limit the application of the protective layer, and the effect is not significant, and achieve excellent friction and wear characteristics. Effect of stress reduction and wear life improvement
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[0016] Select organic self-assembled monomolecular N'-[3-(Trimethoxysilyl)-propyl]driethylenetriamine, tech(TA) as the organic transition layer and P(100)Si as the substrate. First put the substrate in a 60% concentration Boil in sulfuric acid for 30 minutes. Then mix acetone and water into a solvent at a volume ratio of 5:1, and the solute is N'-[3-(Trimethoxysilyl)-propyl]driethylenetriamine, tech(TA). Put the boiled Si substrate into the solvent and solution ( TA) is soaked in the 2-3mmol / L solution. Then, an RF-PECVD equipment is used to deposit diamond-like carbon films on P(100)Si substrates and P(100) silicon substrates prepared with organic self-assembled monolayers. Methane (10.3sccm) and hydrogen (20sccm) were introduced and deposited for 4 minutes under the conditions of radio frequency power of 100W, negative bias voltage of 200V, and deposition pressure of 5 Pa. The thickness of the ultra-thin diamond-like carbon film is about 6nm.
[0017] AFM morphology characte...
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