Method for preparing diamond-like film by liquid-phase electro-deposition technology

Abstract

The invention discloses a preparing method of diamond film through liquid-phase electric sedimenting method in the diamond similar film preparing technical domain, which is characterized by the following: adopting demeso as electrolyte; setting the electrolyzing pressure at 50-500V high-frequency pulse DC pressure; sedimenting at 50-90 Deg C; refluxing vaporized electrolyte to sediment pond through condensing; selecting silica as base before sedimenting; disposing the silica in the acetone through ultrasound; immersing in the fluohydric acid solution; adopting high-purity graphite as anode in the sedimenting course; making disposed silica as cathode with the distance between two electrodes at 7mm; adopting demeso with high-dielectric constant and big dipole distance as electrolyte to prepare the product under lower pressure.

Description

technical field [0001] The invention belongs to the technical field of diamond-like film preparation, and in particular relates to a method for preparing a diamond-like film by liquid-phase electrodeposition. Background technique [0002] Diamond-like Carbon Films (DLC films for short) have a series of characteristics similar to diamond, such as high hardness, low friction coefficient, high resistivity, good biocompatibility, and high transparency from infrared to ultraviolet. It has a good application prospect in the fields of machinery, electronics, medicine, optics, etc. Therefore, the research on it has attracted more and more attention. [0003] The methods for preparing DLC ​​films mainly include physical vapor deposition (PVD) and chemical vapor deposition (CVP), such as ion beam deposition, cathodic arc deposition, sputtering deposition and plasma enhanced chemical vapor deposition, etc., although most of the methods can deposit Films with better quality can be prod...

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Problems solved by technology

However, these deposition processes need to be carried out at a relatively high voltage (1000-3000V), and there may be discharge during the electrolysis process, which makes the experimental operation more difficult.

[0005] At the same time, Novikov (V.P.Novikov, V.P.Dymont, Appl.Phys.Lett., 70 (1997) 200) and Shevchenko (E.Shevchenko, E.Matiushenkov, D.Kochubey, D.Sviridov, A.Kokorin, A. Kulak, Chem.Commun., (2001) 317) deposit DLC film from the liquid ammonia solution of acetylene and the dimethyl sulfoxide solution of acetylene lithium respectively under the voltage of less than 5V, but these methods need to use liquid ammonia or acetylene Gas, and the deposition rate is low, so it is necessary to find a more gentle way to deposit diamond-like films, avoid the use of dangerous gases, and at the same time can be carried out at a lower voltage

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