Etching solution, active component array substrate and method for manufacturing active component array substrate
Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- AU OPTRONICS CORP
- Publication Date
- 2010-08-18
- Estimated Expiration
- Not applicable ยท inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to an active component array substrate, and in particular to an etching solution, an active component array substrate and a manufacturing method thereof. Background technique
[0002] As the size of the thin film transistor liquid crystal display (TFT-LCD) panel becomes larger and larger, it is accompanied by the resistance-capacitance (RC) delay effect caused by the resistance of the metal wire that is not low enough, thus causing distortion and distortion of the signal during transmission. , which affects the presentation of panel quality. Using low-resistance copper metal to form the metal wire can effectively reduce the RC delay effect. At the same time, a molybdenum layer is needed between the copper layer in the active component array substrate and the base material to prevent copper ions from diffusing into the base material. In terms of the etchant of the double-layer structure of the copper layer and the molybde...