Magnetron sputtering pulse power supply with high starting voltage

A technology of magnetron sputtering and start-up voltage, which is applied in the field of surface engineering, can solve problems such as restarting complex, insufficient start-up voltage, plasma load voltage oscillation, etc., to ensure normal progress, film formation quality and efficiency, eliminate oscillation, Effect of high starting voltage

Inactive Publication Date: 2010-09-08
XIAN UNIV OF TECH
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  • Abstract
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Problems solved by technology

[0005] The purpose of the present invention is to provide a magnetron sputtering pulse power supply with high starting voltage, which solves the problems of insufficient starting voltage, oscillation of plasma load voltage and complicated restart after abnormal shutdown in the prior art

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  • Magnetron sputtering pulse power supply with high starting voltage
  • Magnetron sputtering pulse power supply with high starting voltage
  • Magnetron sputtering pulse power supply with high starting voltage

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Embodiment Construction

[0011] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0012] refer to figure 1 , the magnetron sputtering device includes a substrate 6 arranged at the anode and a target 7 arranged at the cathode, and a magnetron sputtering plasma 8 is arranged between the substrate 6 and the target 7 .

[0013] Such as figure 1 The structure of the magnetron sputtering pulse power supply with high starting voltage in the present invention is to include DC input 1, high-voltage starting module 2, pulse generation module 3 and freewheeling module 4 connected in sequence, and freewheeling module 4 and magnetron sputtering The substrate 6 in the device is connected to the target material 7, and the freewheeling module 4 is used to add high-voltage pulses to the substrate 6 and the target material 7 in the magnetron sputtering device; the high-voltage starting module 2 is connected to the abnormality detection mod...

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Abstract

The invention discloses a magnetron sputtering pulse power supply with high starting voltage, which comprises a DC input, a high-voltage starting module, a pulse generating module and a follow current module which are connected in turn, wherein the follow current module is connected with a substrate and a target in a magnetron sputtering device; the high-voltage starting module is connected with an abnormal detection module, and is used for providing a starting voltage of 1,500V for a magnetron sputtering process; the pulse generating module is used for generating pulse bias voltage; the follow current module is used for solving the problem that the output voltage produces large oscillation due to the special property of a plasma load during pulse magnetron sputtering; and the abnormal detection module is used for detecting the change of plasma load current and performing secondary high-voltage startup on the magnetron sputtering process according to the change of the load current when an abnormal condition happens. The power supply structure of the invention has the advantages of improving the ionization rate of plasma in the magnetron sputtering engineering, enhancing the combination strength of a film and a matrix and ensuring a deposition process.

Description

technical field [0001] The invention belongs to the technical field of surface engineering and relates to a magnetron sputtering pulse power supply with high starting voltage. Background technique [0002] Magnetron sputtering technology is widely used in the field of film preparation, and can prepare various films required by industry, such as superhard films, corrosion-resistant and friction-resistant films, superconducting films, magnetic films, optical films, and various Films with special electrical properties, etc. [0003] Due to the low bias voltage of the traditional DC bias magnetron sputtering process, the ability of ion bombardment during the coating process is relatively weak, and the compactness of the coating is relatively poor. The continuous infiltration of corrosive media will cause interface corrosion between the coating and the substrate. As a result, the long-term corrosion resistance of the coating is affected, and target poisoning and "arcing" are pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35H03K3/00
Inventor 陈桂涛孙强姬军鹏施辉李岩
Owner XIAN UNIV OF TECH
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