Plasma generating device and method for generating plasmas

Abstract

The invention provides a plasma generating device and a method for generating plasmas, wherein the plasma generating device concretely comprises a closed vacuum chamber, a semi-closed cathode cavity, an anode metal plate and a negative high voltage power supply, wherein the closed vacuum chamber comprises a gas inlet and a gas outlet; the semi-closed cathode cavity is positioned in the vacuum chamber, and the outer surface of the semi-closed cathode cavity is covered by an insulating medium; the anode metal plate is positioned in the vacuum chamber; the negative terminal of the negative high voltage power supply is connected with the semi-closed cathode cavity, and the grounding terminal of the negative high voltage power supply is connected with the anode metal plate; the axial line of the semi-closed cathode cavity is parallel with the anode metal plate; and when working gas is introduced into the vacuum chamber, the distance between the semi-closed cathode cavity and the anode metal plate is adjusted to enable the product of the distance and the pressure of the working gas to be greater than a local discharge threshold. The invention is used for generating local plasmas meeting requirements.

Description

technical field [0001] The invention relates to the field of plasma technology, in particular to a plasma generating device and a method for generating plasma. Background technique [0002] At present, plasma sources have a wide range of application values ​​in the fields of material surface modification, harmful gas treatment, dynamic control of electromagnetic wave propagation, scientific research, etc. The requirements for plasma sources in these fields generally include high electron density, uniform discharge, and stability. so wait. [0003] In many industrial applications and scientific research, the main ways to generate high-density plasma are: high-power microwave, thermal ionization and gas discharge, etc. Among them, due to the advantages of uniform discharge, stability and simple structure, low-pressure gas discharge has become A common means of generating a large volume, stable plasma source. [0004] Based on the principle of low-pressure gas discharge, exis...

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Problems solved by technology

[0005] However, in some special applications, such as plasma microstrip dynamic control switch, plasma-filled waveguide, material inner surface treatment, etc., it is often necessary to use localized plasma, that is, it is required to generate high Density plasma, while no discharge occurs in other places, so as to avoid affecting the overall performance of the system; while the plasma generated by existing devices is usually scattered in the controlled environment, which cannot meet the above requirements

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