Scratch resistant and shock proof propylene-ethylene block copolymerization polypropylene modified material
A technology of copolymerizing polypropylene and ethylene blocks, applied in the field of propylene-ethylene block copolymerized polypropylene modified materials, can solve the problems of poor impact performance, easy precipitation on the surface, reducing material strength and toughness, etc., and achieve excellent scratch resistance. The effect of wiping performance, broad market prospect and simple operation
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1~5
[0045] Propylene-ethylene block copolymerized polypropylene, talcum powder, elastomer, silicone powder, processing aids, stabilizers and other components were uniformly mixed in a mixer according to the proportions in parts by weight in Table 1. The mixed material is fed into the twin-screw extruder from the feeder. The temperature of the twin-screw extruder from the feeding section to the head is as follows: 190°C, 210°C, 220°C, 220°C, 220°C, 220°C, 220°C, the temperature of the die is: 210°C. After high-speed twin-screw (screw speed: 800r / min) shearing and mixing, extruding from the machine head, drawing, air cooling, pelletizing, drying and packaging, the propylene-ethylene block copolymer polypropylene modified material is obtained. finished product.
[0046] Table 1
[0047] Component
Example 1
Example 2
Example 3
Example 4
Example 5
Propylene-Ethylene Block Copolymerization
54Kg
61Kg
...
PUM
![No PUM](https://static-eureka.patsnap.com/ssr/23.2.0/_nuxt/noPUMSmall.5c5f49c7.png)
Abstract
Description
Claims
Application Information
![application no application](https://static-eureka.patsnap.com/ssr/23.2.0/_nuxt/application.06fe782c.png)
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap