Photovoltaic devices with high-aspect-ratio nanostructures
A nanostructure, high aspect ratio technology, applied in the field of nanotechnology, can solve the problems of low conversion efficiency, reluctance to choose, etc.
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[0049] The method is further illustrated by reference to the following non-limiting examples.
[0050] Nanowire photovoltaic cells based on Schottky junctions: An n-doped Si substrate was coated with a three millimeter (mm) thick layer of Au using thermal evaporation of Au. Next, the wafer is placed in a CVD chamber, and in hydrogen (H 2 ) with an airflow of 200 standard cubic centimeters per minute (sccm), heated to 550°C. As a result, Au forms islands on the surface of the Si substrate to a pH of 50 sccm which acts as a doping precursor (i.e., will be converted to a dopant later during nanowire growth). 3 In the presence of 50sccm SiH 4 When the gas flow is introduced into the CVD chamber, the Si nanowires are preferentially nucleated. Then, nanowires are grown using VLS-CVD. After growing the nanowires, any remaining Au was removed using an iodine-based etchant type TFA (manufacturing company: Transene Company, Danvers, MA). The native silicon dioxide (SiO 2 ) layer (...
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