Rotating platform supported by air flotation

A rotary table and air flotation technology, applied in the field of integrated circuit manufacturing, can solve the problems of unstable movement of the support structure, many intermediate links of the rotary table, and slow response speed, so as to improve the positioning accuracy of the system, less intermediate links, and fast response speed Effect

Active Publication Date: 2011-07-20
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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  • Abstract
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Problems solved by technology

[0004] The object of the present invention is to provide a rotary table supported by air bearings, so as to solve the problem of many intermediate links, slow response speed, low positioning accuracy, and unstable movement of the support structure in the rotary table driven by a rotary motor and a screw mechanism in the photolithography process. The Problem with Nonlinear Errors

Method used

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  • Rotating platform supported by air flotation
  • Rotating platform supported by air flotation
  • Rotating platform supported by air flotation

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Embodiment Construction

[0029] The rotating table supported by air bearing provided by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that the drawings are all in a very simplified form and use imprecise ratios, which are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.

[0030] The core idea of ​​the present invention is to provide a rotary table supported by air bearing. The rotary table is coupled with the cam follower and the push plate, and the push plate is connected with the workbench, and the linear motion of the linear motor is converted by the cam follower. Rotational movement, thereby reducing intermediate links and improving response speed. At the same time, its rotation center positioning mechanism is made of fl...

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Abstract

The invention discloses a rotating platform supported by air flotation. The rotating platform comprises a workbench, a base plate, a vertical air floatation support mechanism, a rotating centre location mechanism and a driving mechanism. The vertical air flotation support mechanism is used for supporting the workbench on the base plate. The rotating centre location mechanism is used for driving the workbench to rotate along a vertical direction, and determining a rotation centre. The driving mechanism is used for converting the linear motion of a linear motor into the rotary motion. The rotating platform provided by the invention is less in intermediate links, fast in response speed and high in location accuracy, and simultaneously the vertical air flotation support mechanism can eliminate nonlinear error of guide mechanisms like an idler wheel, so that the system location accuracy can be further improved.

Description

technical field [0001] The invention relates to the field of integrated circuit manufacturing, in particular to an air-supported rotary table used for carrying silicon wafers in the photolithography process. Background technique [0002] The development of microelectronics technology has promoted the replacement of computer technology, communication technology and other electronic information technologies, and plays an important leading and basic role in the revolution of the information industry. Production equipment plays a pivotal role in the entire microelectronics industry, and in the manufacturing equipment of microelectronic devices, the lithography equipment has the largest investment and the most critical role. With the improvement of integrated circuit integration, the positioning accuracy requirements of lithography machines are getting higher and higher, and in the positioning mechanism of lithography machines, the rotary table plays a very key role. "Six degree...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 周清华
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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