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Cleaning device and coating device for slit nozzle

A technology of slit nozzle and cleaning device, which is applied in the direction of spraying device, spraying device, cleaning method and utensils, etc., which can solve the problems of resist film thickness variation, obstruction and disturbance of resist spray flow, etc., and improve the quality , Improve cleaning efficiency and improve cleaning ability

Inactive Publication Date: 2011-08-24
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Generally, in a slit nozzle, when the ejection operation is stopped, the resist liquid tends to adhere or remain near the ejection port. If it is left as it is and dried and solidified, it will hinder or disturb the resist ejection flow during the next coating process. , may cause changes in resist film thickness

Method used

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  • Cleaning device and coating device for slit nozzle
  • Cleaning device and coating device for slit nozzle
  • Cleaning device and coating device for slit nozzle

Examples

Experimental program
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Embodiment Construction

[0041] Hereinafter, the best mode for carrying out the present invention will be described with reference to the accompanying drawings.

[0042] figure 1 This is a configuration example of a resist coating apparatus to which the slit nozzle cleaning apparatus of the present invention can be applied.

[0043] The resist coating device includes: a suspension table 10 for suspending a substrate to be processed, such as a glass substrate G for FPD, in the air by gas pressure; direction) the substrate transport mechanism 20 for transporting the substrate G suspended in the air; the slit nozzle 32 for supplying the resist liquid to the upper surface of the substrate G transported on the floating table 10; and the slit nozzle 32 for intermittent recovery of the coating process The nozzle recovery portion 42 of the slit nozzle 32 is provided.

[0044] The upper surface of the suspension table 10 is provided with a plurality of gas injection holes 12 for injecting a predetermined gas...

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PUM

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Abstract

The invention provides a cleaning device for a slit nozzle, the cleaning device are capable of effectively spray outlet periphery portion of a slit nozzle. A slit nozzle cleaning portion (52) is provided with a slide rack (64) moving along the spray outlet periphery portion of a slit nozzle (32) in a horizontal cleaning scanning direction (Y direction) parallel to a long-side direction of the slit nozzle, in the cleaning scanning direction, a first cleaning unit (70) as a start and followed by a first wiping unit (72), a second cleaning unit (74), a second wiping unit (76), and a drying unit (78), the above units are mounted on the slide rack (64) via arrangement in a line according to the above sequence.

Description

technical field [0001] The present invention relates to a spinless coating apparatus, and more particularly, to a slit nozzle cleaning apparatus for cleaning a peripheral portion of a discharge port of a slit nozzle used in a spinless coating process. Background technique [0002] In the image lithography process in the manufacturing process of flat-panel displays (FPD) such as LCDs, a spin-free coating method is often used. A substrate to be processed such as a substrate moves relatively, and a coating liquid such as a processing liquid or a chemical liquid, for example, a resist liquid, is applied on the substrate. [0003] In a typical spinless coating method, a strip-shaped resist liquid is ejected through a slit nozzle on a substrate fixedly mounted on a table, and the slit nozzle is set at a level perpendicular to the longitudinal direction of the nozzle. direction move. In this way, the resist liquid overflowing onto the substrate from the discharge port of the slit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05B15/02B05C5/02
CPCB05B1/044B05C11/10B05C21/00B08B3/04
Inventor 小笠原幸雄宫崎文宏元田公男
Owner TOKYO ELECTRON LTD
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