Ultraviolet avalanche diode imaging array pixel, application method thereof and avalanche transistor imaging array
An imaging array and ultraviolet avalanche technology, which is applied to radiation control devices and other directions, can solve the problems of low yield, high defect density, and inability to realize ultraviolet avalanche tube imaging arrays, and achieves the effect of improving yield and increasing photosensitive area.
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[0050] Such as Figure 3A Shown is a schematic diagram of the imaging array pixel of the ultraviolet avalanche tube of the present invention.
[0051] If the ultraviolet avalanche tube imaging array pixel UV-APD 300 is composed of a plurality of basic units UV-APD 200 (such as Figure 3B ) in parallel configuration, the radius of the UV-APD 200 can be 1 μm to 50 μm. exist Figure 3B Among them, we can form the substrate 201 from bottom to top. The substrate 201 can be made of materials such as SiC, sapphire, and silicon substrates, but the substrate is required to be transparent; the materials of the n-type semiconductor 202 and the p-type semiconductor 204 can be GaN, For materials such as AlN and AlGaN, n-type semiconductor 202 and p-type semiconductor 204 can be epitaxially grown by MOCVD, which also has a buffer layer, thereby reducing lattice dislocations in the material and reducing defect density; then etching the p-type semiconductor to expose Part of the n-type sem...
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