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System for controlling active vibration isolation device

A control system and vibration isolation technology, which can be used in non-rotational vibration suppression, photoengraving process exposure devices, microlithography exposure equipment, etc. The effect of generating heat, reducing power and improving positioning accuracy

Active Publication Date: 2013-04-10
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this solution, the materials of the four airbags are relatively special, and the service life of the rubber airbags is easily affected by the large front-to-back pressure difference
Among them, four vertical voice coil motors are used in the above technical solution, the structure is more complicated, and the relative control strategy is also more complicated, and the power consumed by the vertical voice coil motors is large, and the heat generation is high. The control accuracy of the moving table is also affected

Method used

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  • System for controlling active vibration isolation device
  • System for controlling active vibration isolation device
  • System for controlling active vibration isolation device

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Experimental program
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Effect test

Embodiment Construction

[0012] In order to better understand the technical content of the present invention, specific embodiments are given and described below in conjunction with the accompanying drawings.

[0013] like Figure 1 to Figure 4 , In the control system of the active vibration isolation device of the present invention, it is used in the active vibration isolation device of the micro-movement table 101 in the workpiece table system, and the active vibration isolation device includes an air gravity compensator 201 and a voice coil motor 202 . The control system of the active vibration isolation device of the present invention adopts the air gravity compensator 201 to support the gravity of the micro-moving table (Chuck) 101 in the workpiece table system, and the air-floating structure of the air-gravity compensator 201 also provides the micro-moving table (Chuck). ) 101's vertical (Z-direction) vibration isolation and vertical (Z-direction) fine-tuning function. Since the air gravity comp...

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Abstract

The invention provides a system for controlling an active vibration isolation device, wherein a split-type designed air gravity compensator and a voice coil motor are adopted and the air gravity compensator is used for supporting the gravity of a micropositioner to ensure that the voice coil motor is only used for providing a positioning function for the micropositioner and providing a driving force to generate acceleration to realize the ascending motion of the micropositioner. By utilizing the control system design, the dissipated power of a conventional voice coil motor, caused by resisting the gravity of the micropositioner, is greatly reduced; the calorific value of the voice coil motor is decreased to a great extent; in the mean time, as the voice coil motor is only used for providing the positioning function and the ascending motion for the micropositioner, the positioning accuracy of the micropositioner is improved to a certain degree.

Description

technical field [0001] The present invention relates to the technical field of lithography devices, and in particular, to a control system of an active vibration isolation device. Background technique [0002] With the continuous improvement of the integration of large-scale integrated circuit devices and the continuous enhancement of lithography resolution, the requirements for the feature line width indicators of lithography machines are also constantly improving. At present, the lithography machine has developed into a combination of several independent internal worlds for vibration isolation and vibration isolation, and the external world of other structures such as the basic frame. [0003] Taking the workpiece stage system of the lithography machine as an example, how to make the Chuck free from the interference of the workpiece stage system and the vibration of the base frame during the exposure process is very important. Vibration reduction and isolation. The gravi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20F16F15/02
Inventor 赵娟吴立伟
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD