Low temperature plasma generating device for removing biomembrane in dental canal

A plasma and generating device technology, applied in plasma, dentistry, tooth filling, etc., can solve the problems of limited sterilization effect and easy recurrence, and achieve the effect of strong practicability and avoiding arc discharge

Inactive Publication Date: 2011-11-02
PEKING UNIV
View PDF5 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Commonly used drugs in medicine such as Ca(OH) 2 To remove root canal biofilm, due to its good biocompatibility, but the bactericidal effect is limited and easy to relapse!

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Low temperature plasma generating device for removing biomembrane in dental canal
  • Low temperature plasma generating device for removing biomembrane in dental canal

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] figure 1 It is a schematic structural diagram of the present invention, including a working gas source 1, a power supply 5, a control switch 4, an annular high-voltage electrode 6, a dielectric tube 8, and an insulating protection ring 7. The annular high-voltage electrode surrounds the dielectric tube 8, and together Located in the insulating protection ring 7, the power supply 5 is connected to the annular high-voltage stage 6 through the control switch 4, and the gas flow control switch 2 enters the working gas 3 of the working gas source 1 into the inside of the medium pipe 8 through the inlet port, and from the medium pipe 8 A plasma jet 9 is emitted near the outlet end of the tooth 10 .

[0014] The ring-shaped high-voltage electrode 6 is closely attached to or tightly sleeved on the outer wall of the dielectric tube 8, and the insulating protection ring 7 is also closely attached to the outer wall of the ring-shaped high-voltage electrode 6

[0015] The annular ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a plasma generating device. The objective of the invention is to remove biomembranes in dental canals with low temperature plasmas by putting the device in oral cavity. According to the invention, an annular high voltage electrode clinging to the outer wall of a dielectric tube is appressed by an insulation guard ring and is connected with a power supply; the dielectric tube is hollow, with one end communicating with working gas and the other end bent for convenience in dealing with teeth in oral cavity; through utilization of different power supply parameters and gas sources, plasmas with a temperature close to room temperature can be generated, and in the same time the plasmas are allowed to have a long jet flow adjustable intensity and abundant active components; the position of the electrode is safe and reliable; a plurality of gas can be used as gas sources; therefore, the device has a wide application scope.

Description

technical field [0001] The invention relates to a plasma generating device, in particular to a low-temperature plasma generating device for removing biofilm in root canals. Background technique [0002] Plasma is an ionized gas-like substance composed of atoms deprived of some electrons and positive and negative electrons generated after the atoms are ionized. It is called the fourth state of matter except solid, liquid, and gas. Plasma can be divided into high-temperature plasma and low-temperature plasma according to temperature, among which low-temperature plasma is the most widely used type of plasma, which is widely used in materials, electronics and other fields. There are mainly four types of devices for generating low-temperature plasma, namely AC low-temperature plasma generator, radio-frequency low-temperature plasma generator, microwave low-temperature plasma generator, and DC pulse plasma generator. [0003] Biofilm refers to bacteria that adhere to the contact ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61C5/02H05H1/26
Inventor 梁永东孙科朱卫东张珏方竞
Owner PEKING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products