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Back compensation-based transparent substrate film thickness measurement system

A transparent substrate and film thickness technology, applied in the direction of measuring devices, instruments, optical devices, etc., can solve the problems of complexity, lack of versatility and accuracy of fixed coefficient compensation, damage to film substrates, etc.

Inactive Publication Date: 2012-11-14
ZHEJIANG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But when the reflectivity of the film itself is small, the effect of this back reflection cannot be ignored, otherwise it will cause a huge measurement error
The usual solution is to eliminate back reflection by coating the back of the substrate with a matting material, which will destroy the substrate of the film; in addition, some methods multiply the mixed reflectance by a fixed coefficient to eliminate back reflection, but the back reflection It is a complex variable, which is related to the transparent substrate material and substrate thickness of the film, and the fixed coefficient compensation lacks versatility and accuracy

Method used

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  • Back compensation-based transparent substrate film thickness measurement system
  • Back compensation-based transparent substrate film thickness measurement system
  • Back compensation-based transparent substrate film thickness measurement system

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Embodiment Construction

[0057] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0058] Such as figure 1 As shown, the transparent substrate film thickness measurement system based on back compensation includes a light source 1 , a spectrometer 2 , a PC 3 , a measurement platform 4 and a reflectivity fiber optic probe 5 . The reflectivity fiber optic probe 5 is set above the measurement platform 4, and is respectively connected to the light source 1 and the spectrometer 2, and the spectrometer 2 is connected to the PC 3; 4 on the film 6 with a transparent substrate 7 to be measured, the reflected light of the transparent substrate 7 and the film 6 enters the receiving end face of the reflectivity fiber optic probe 5 at the same time, and is received by the spectrometer 2, and the data received by the spectrometer 2 passes through the computer 3. Compensation processing is calculated to obtain the thickness of the film to...

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Abstract

The invention discloses a back compensation-based transparent substrate film thickness measurement system which comprises a light source, a spectrograph, a reflectivity optical fiber probe, a measurement platform and a PC (Personal Computer), wherein the reflectivity optical fiber probe is arranged on the measurement platform and respectively connected with the light source and the spectrograph; the spectrograph is connected with the PC; light emitted by the light source irradiates on a to-be-measured film which is arranged above the measurement platform with a transparent substrate through the reflectivity optical fiber probe; the reflecting lights of the substrate and the film are simultaneously received through spectrograph after entering the reflectivity optical fiber probe; and the received data is subjected to the compensation processing calculation of the PC to obtain all layers of practical thicknesses of the film. The system disclosed by the invention does not need to coat anextinction substance on the back of a sample wafer for eliminate back reflection and does not need to damage the film substrate. The system disclosed by the invention is simple and flexible and is automatically adapted to various transparent substrates with different materials and different thicknesses. The whole system has the advantages of simple structure, lower cost, miniaturization, nondestructive detection, and the like.

Description

technical field [0001] The invention relates to the technical field of film measurement, in particular to a transparent substrate film thickness measurement system based on back compensation. Background technique [0002] Thin film optics is an important branch of applied optics. Although the initial development was limited by scientific and technological conditions, with the rapid development of a series of disciplines such as spectral interference technology, laser technology and space optics, thin film optics has also developed rapidly. Optical thin films can control light beams through special structures and generate special light beams. They have independent applications in many fields such as lens manufacturing. With the advancement of science and technology, optical thin films have also begun to play an important role in optoelectronics and optical communications. . In order to obtain better optical properties of the film, it is necessary to precisely control the th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/06
Inventor 宫兴致刘鹏余飞鸿
Owner ZHEJIANG UNIV