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Method for producing multi-color photomask and method for pattern transfer

A manufacturing method and photomask technology, which can be applied to the photolithographic process of the patterned surface, the original for photomechanical processing, semiconductor/solid-state device manufacturing, etc., which can solve the problems of uneven film reduction speed and difficult film reduction Shape control, large density difference of resist pattern, etc., achieve the effect of improving formation accuracy and improving in-plane uniformity

Active Publication Date: 2011-11-30
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, it is difficult to accurately control the shape of the subtractive film, which sometimes leads to a decrease in the formation accuracy of the transfer pattern
Especially in photomasks for FPDs, the density difference of the resist pattern is large, so there is a tendency that the film-reducing speed is uneven

Method used

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  • Method for producing multi-color photomask and method for pattern transfer
  • Method for producing multi-color photomask and method for pattern transfer
  • Method for producing multi-color photomask and method for pattern transfer

Examples

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Effect test

no. 1 Embodiment approach

[0053] Below, refer to figure 1 and figure 2 A first embodiment of the present invention will be described. figure 1 It is a flowchart of the manufacturing process of the multi-tone photomask 10 of this 1st Embodiment. figure 2 It is a cross-sectional view showing a pattern transfer method using the multi-tone photomask 10 .

[0054] (1) Manufacturing method of multi-tone photomask

[0055] (Photomask blank preparation process)

[0056] First, as figure 1 As exemplified in (a) 1, a photomask blank 10b is prepared, which has a semi-transparent film 101 and a light-shielding film 102 formed in this order on the transparent substrate 100, and a resist film 102 is formed on the uppermost layer. Etch film 103 .

[0057] The transparent substrate 100 is formed, for example, as a flat plate made of quartz (SiO 2 ) glass, or containing SiO 2 , Al 2 O 3 , B 2 O 3 , RO (R is an alkaline earth metal), R 2 O(R 2 It is composed of low-expansion glass such as alkali metal). ...

no. 2 Embodiment approach

[0099] Next, a second embodiment of the present invention will be described. In the second embodiment, oxygen or ozone gas may be used instead of ozone water, and light irradiation may be performed in an environment where the gas exists, thereby realizing an excess supply state of gaseous ozone or ozone-containing active oxygen. Thereby, the difference from the above-described first embodiment is that the generation of active oxygen is promoted, thereby reducing the film of the first resist pattern 103p. Below, refer to figure 1 Differences from the above-described first embodiment will be described in detail.

[0100] The manufacturing method of the multi-tone photomask 10 of the second embodiment is also the same as that of the above-described first embodiment. figure 1 The illustrated manufacturing process, however, in the manufacturing method of the multi-tone photomask 10 according to the second embodiment, is performed by light irradiation while supplying ozone gas. f...

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Abstract

A manufacturing method of multicolour dimming mask and a pattern transfer method provided by the invention can reduce drawing and developing times by using membrane reduction of anti-corrosion patterns, and can improve inplane uniformity of membrane reduction speed of the anti-corrosion patterns between a dense part and a sparse part. The manufacturing method comprises steps of: forming a first anti-corrosion pattern, wherein the first anti-corrosion pattern covers a formation region of a shading portion and a formation region of a half-transmitting portion, and thickness of a resist film of the formation region of the half-transmitting portion is smaller than that of a resist film of the formation region of the shading portion, and feeding ozone to the first anti-corrosion pattern, wherein the feeding method is as follows: active oxygen per unit area provided to the first anti-corrosion pattern is larger than active oxygen per unit area consumed by membrane reduction conducted on thefirst anti-corrosion pattern.

Description

technical field [0001] The present invention relates to a method for producing a multi-tone photomask used in the production of flat panel displays (Flat Panel Display: hereinafter referred to as FPD), for example, a liquid crystal display device, and a pattern transfer method using the multi-tone photomask . Background technique [0002] For example, a thin film transistor (Thin Film Transistor: hereinafter referred to as TFT) substrate for FPD uses a photomask in which a transfer pattern consisting of a light shielding portion and a light transmitting portion is formed on a transparent substrate. produced by the photolithography process. In recent years, in order to reduce the number of photolithography steps, a multi-tone photomask in which a transfer pattern including a light-shielding portion, a semi-transparent portion, and a light-transmitting portion is formed on a transparent substrate has been used. [0003] In the above-mentioned multi-tone photomask, for exampl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/14G03F7/20G03F7/00G03F1/00G03F1/68G03F1/80
CPCG03F1/58G03F1/66H01L21/0275H01L21/0337
Inventor 长岛奖
Owner HOYA CORP
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