Method of fabricating pattern
A manufacturing method and pattern technology, which can be applied in printed circuit manufacturing, cable/conductor manufacturing, photoplate-making process of patterned surface, etc., can solve problems such as low laser absorption rate, multi-light energy pattern width increase, etc. Absorption rate, laser absorption rate improvement, thermal diffusion reduction effect
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[0054] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. However, the accompanying drawings are only used to better explain the contents of the present invention, and the scope of the present invention is not limited to the scope of the accompanying drawings, which should be easily understood by those skilled in the art. The advantages, features and implementation methods of the present invention will be very clear with reference to the accompanying drawings and the following detailed description. The same reference signs denote the same constituent elements throughout the specification. Marangony flow and hydrodynamic flow are necessary and will continue to be mentioned to explain the problems existing in the existing pattern manufacturing method and the effect of the present invention. However, marangony flow and hydrodynamic flow are explained together after the introduction of each claim.
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