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275results about How to "Improve light absorption" patented technology

Intelligent plant supplementary lighting method and device

The invention relates to an intelligent plant supplementary lighting method. The method comprises the following steps: setting a red light threshold and a blue light threshold according to the demand of a plant on red light and blue light in each growth stage; detecting the intensities of the red light and the blue light in the growing environment of the plant; comparing the intensities with the corresponding red light threshold and blue light threshold to judge whether supplementary lighting is required and determine the accurate volume of the supplementary lighting; if the supplementary lighting is required, calculating the input current of a corresponding supplementary lighting set according to the volume of the supplementary lighting, so as to accurately control the intensity of the supplementary lighting set and realize intelligent and accurate supplementary lighting on demand, and if the supplementary lighting is not required, turning off the supplementary lighting set. The invention also provides a device realizing the method. By utilizing the supplementary lighting method and device in the invention, quantitative demand supplementary lighting by wavelength can be carried out on the plant according to the characteristics in different growth stage of the plant.
Owner:NORTHWEST A & F UNIV

Back-illuminated Si-PIN photoelectric detector taking black silicon material as photosensitive layer and manufacturing method thereof

The invention discloses a back-illuminated Si-PIN photoelectric detector taking a black silicon material as a photosensitive layer and a manufacturing method thereof, belonging to the technical field of photoelectric detection. The photoelectric detector comprises a silicon intrinsic substrate, a P-type area located in the centre of the front surface of the silicon intrinsic substrate, an annularP+ area located around the front surface of the silicon intrinsic substrate, an N-type black silicon layer located on the back surface of the silicon intrinsic substrate, upper electrodes located on the upper surface of the P-type area and the P+ area, and lower electrodes located on the two sides of the lower surface of the N-type black silicon layer. According to the invention, the black silicon material is used as the photosensitive layer, and an annular P+ area 3 is increased around the P-type area 2 so that the back-illuminated Si-PIN photoelectric detector disclosed by the invention canabsorb light waves of near-infrared band and has higher light absorptivity and wider response band than a traditional Si photoelectric detector; the manufacturing process is relatively simple and hasthe characteristics of low cost, fast response speed, high responsiveness and wide response band, is easy to realize integration, and has obvious advantages in large-scale marketization.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA

Silicon-avalanche photodetector (Si-APD) with black silicon as photosensitive layer and preparation method thereof

InactiveCN103137773ALarge light signal currentWide response bandRenewable energy productsSemiconductor devicesPhotovoltaic detectorsResponsivity
The invention discloses a silicon-avalanche photodetector (Si-APD) with black silicon as a photosensitive layer and a preparation method of the Si-APD with the black silicon as the photosensitive layer, and belongs to the field of photoelectric detection technology. The Si-APD comprises a silicon intrinsic substrate 1, an N<+> region 2, a P type region 3, an annular N type region 4, an N<+> region black silicon layer 5, a P<+> region 6, an upper electrode 7 and a lower electrode 8, wherein the N<+> region 2 is located in the middle of the upper surface of the silicon intrinsic substrate 1, the P type region 3 is located below the N<+> region, the annular N type region 4 is located on the periphery of the upper surface of the silicon intrinsic substrate, the N<+> region black silicon layer 5 is located on the upper surface of the N<+> region, the P<+> region 6 is located on the lower surface of the silicon intrinsic substrate, the upper electrode 7 is located on the upper surfaces of the N<+> region black silicon layer and the annular N type region, and the lower electrode 8 is located on the lower surface of the P<+> region. According to the Si-PAD, the black silicon material serves as the photosensitive layer, and meanwhile the annular N type region is additionally arranged on the peripheries of the N<+> region and the P type region. Thus, the Si-APD with the black silicon as the photosensitive layer can absorb light waves of a near-infrared band and have higher light absorptivity and a wider response wave band, the preparation technique is simple, the cost is low, and the Si-PAD has the advantages of being easy to integrate, quick in response speed, high in responsivity and wide in response wave band.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA

Flexible thin-film solar photoelectric cell and large-scale continuous automatic production method thereof

The invention provides a flexible thin-film solar photoelectric cell and a large-scale continuous automatic production method thereof. The solar photoelectric cell comprises an antireflection layer, a transparent upper electrode layer, an isolating layer, a window layer, a protective layer, an absorbing layer, a reflecting layer, a metal back electrode layer, an insulating layer, a substrate layer and a solder flux layer in sequence. The material of the antireflection layer is magnesium fluoride, the material of the transparent upper electrode layer is aluminum zinc oxide, the material of the isolating layer is intrinsic zinc oxide, the material of the window layer is zinc sulfide, the material of the protective layer is sulfur or zinc, the material of the absorbing layer is CIGS (copper indium gallium diselenide) or CIAS (copper indium aluminum diselenide), the material of the reflecting layer is aluminum, the material of the metal back electrode layer is copper-molybdenum-sodium alloy, the material of the insulating layer is titanium oxide, and the material of the substrate layer is stainless steel, copper, aluminum foil or polyimide film. The production method of the flexible thin-film solar photoelectric cell comprises sputtering layer by layer in a closed environment on a continuous automatic production line through a plurality of sputtering methods to form a multilayer structure. The large-scale continuous automatic production method provided by the invention has the advantages of high efficiency, high quality, and low cost.
Owner:江苏航天之光新能源装备有限公司

Thermoelectric generator capable of effectively absorbing solar energy

The invention discloses a thermoelectric generator capable of effectively absorbing solar energy. A semiconductor thermoelectric power generation sheet assembly comprises an upper insulation heat-conduction plate I, a semiconductor thermoelectric device and a lower insulation heat-conduction plate II; the three are sequentially arranged from top to bottom; a carbon nano-particle film is attached to the upper surface of the upper insulation heat-conduction plate I; a cooling system is attached to the lower surface of the lower insulation heat-conduction plate II; and an insulation layer is arranged around the semiconductor thermoelectric power generation sheet assembly. The device is simple in structure and small in volume; when the sun as a heat source irradiates the carbon nano-particle film, due to the rough micro-surface and carbon nano-particles of different particle diameters, sunlight is nearly absorbed by the carbon nano-particle film completely; a radiator rapidly dissipates heat on the lower surface of the semiconductor thermoelectric power generation sheet assembly, so that a cold end is formed; after the cold and hot ends of the semiconductor thermoelectric power generation sheet based on the seebeck effect form a temperature difference, thermoelectromotive force is generated; electric energy is stably output; furthermore, the investment cost is low; the service lifeis long; and electricity generation is steady.
Owner:CHINA UNIV OF MINING & TECH

Optical multilayer disk, multiwavelength light source, and optical system using them

When a wavelength of a first laser beam with which a first recording medium including a first recording layer is recorded and reproduced is indicated as λ1 (nm), a wavelength of a second laser beam with which a second recording medium including a second recording layer is recorded and reproduced as λ2 (nm), the relationship between the wavelength λ1 and the wavelength λ2 is set to be expressed by 10≦|λ1−λ2|≦120. The first recording layer has a light absorptance ratio of at least 1.0 with respect to the wavelength λ1. The light transmittance of the first recording medium with respect to the wavelength λ2 is set to be at least 30 in both the cases where the recording layer is in a crystal state and in an amorphous state. In order to record and reproduce the optical multilayer disk with the above-mentioned characteristics, a multiwavelength light source with the following configuration is used. Wavelengths of fundamental waves with different wavelengths from injection parts formed at one end of a plurality of optical waveguides, which satisfy phase matching conditions different from one another and are formed in the vicinity of the surface of a substrate, are converted simultaneously, and the first and second laser beams are emitted from emission parts formed at substantially the same position at the other end of the optical waveguides. This enables an optimum optical system for high density recording and reproduction to be obtained.
Owner:PANASONIC CORP

Optical multilayer disk, multiwavelength light source, and optical system using them

When a wavelength of a first laser beam with which a first recording medium including a first recording layer is recorded and reproduced is indicated as λ1 (nm), a wavelength of a second laser beam with which a second recording medium including a second recording layer is recorded and reproduced as λ2 (nm), the relationship between the wavelength λ1 and the wavelength λ2 is set to be expressed by 10≦|λ1−λ2|≦120. The first recording layer has a light absorptance ratio of at least 1.0 with respect to the wavelength λ1. The light transmittance of the first recording medium with respect to the wavelength λ2 is set to be at least 30 in both the cases where the recording layer is in a crystal state and in an amorphous state. In order to record and reproduce the optical multilayer disk with the above-mentioned characteristics, a multiwavelength light source with the following configuration is used. Wavelengths of fundamental waves with different wavelengths from injection parts formed at one end of a plurality of optical waveguides, which satisfy phase matching conditions different from one another and are formed in the vicinity of the surface of a substrate, are converted simultaneously, and the first and second laser beams are emitted from emission parts formed at substantially the same position at the other end of the optical waveguides. This enables an optimum optical system for high density recording and reproduction to be obtained.
Owner:PANASONIC CORP

Solar battery assembly of copper-indium-gallium-selenium thin film and preparation method of light absorption layer thereof

The invention relates to a solar battery assembly of a copper-indium-gallium-selenium thin film, which comprises a substrate, a back electrode layer, a light absorption layer, a buffer layer, a window layer, a transparent electrode layer and a metal grid electrode layer which are overlapped in sequence, wherein a forbidden bandwidth of the light absorption layer is distributed in a trapezoid shape which is flat at the middle part and gradually-heightened at both sides in a thickness direction. With the adoption of the trapezoid structure of the forbidden band, sunlight can be absorbed within a wider spectral region to ensure the sunlight to be sufficiently absorbed by the light absorption layer, so that the light absorption rate can be improved; and meanwhile, a potential difference whichis changed to both sides of the light absorption layer is generated through the trapezoid structure of the forbidden band, and therefore the solar battery assembly of the copper-indium-gallium-selenium thin film has the advantages of higher light absorption rate and good electric properties by ensuring a short-circuit current and effectively improving an open-circuit voltage. In addition, the invention provides two preparation methods of the light absorption layer of the copper-indium-gallium-selenium thin film solar battery assembly.
Owner:THE CHINESE UNIVERSITY OF HONG KONG +1

Photoelectric detector and preparation method thereof

The invention discloses a photoelectric detector, and the photoelectric detector comprises an absorption layer, a metal layer, a dielectric film and reflective metal, which are sequentially arranged from a bottom layer to a top layer. The absorption layer is used for absorbing target detection light. The metal layer comprises a strip-shaped grating and an upper contact electrode, and one side of the strip-shaped grating is located on the absorption layer, and the strip-shaped grating is used for gathering target detection light, and the upper contact electrode is electrically connected with alower contact electrode through a voltage. One side of the dielectric film is located above the other side of the strip-shaped grating, and the other side of the dielectric film is located below the reflective metal. The dielectric film is used for providing a cavity of the resonant cavity, and the reflective metal is used for reflecting target detection light. The invention also provides a preparation method of the photoelectric detector. According to the invention, a transverse resonant cavity effect and a longitudinal resonant cavity effect can be formed at the same time through the strip-shaped grating and the reflecting metal, and the higher light absorption rate is obtained in a thin absorption region. Moreover, the structure of the detector is simpler than the structure of a resonant cavity resonance detector, and the manufacturing cost is reduced.
Owner:HISILICON OPTOELECTRONICS CO LIMITED
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