The present invention relates to the technical field of target manufacturing and provides a MOS target, a method for manufacturing the same, and a thin-film
transistor. The manufacturing method includes the steps of: co-precipitating a mixed
salt solution of three types of ions, In, Ga, and Sn, a precipitating agent, and a complexing agent, washing and concentrating the mixture to obtain high-purity
indium gallium tin hydroxide colloid; hydrothermally reacting the high-purity
indium gallium tin hydroxide colloid with an auxiliary agent, washing and
drying the mixture to obtain first
indium gallium tin oxide powder; performing a
calcination treatment on the first indium gallium
tin oxide powder to obtain second indium gallium
tin oxide powder; ball-milling the second indium gallium
tin oxide powder, a dispersant, an antifoaming agent, and pure water to obtain a
slurry;
casting the
slurry to obtain a molded body; and
sintering the molded body under high-
oxygen conditions to obtain a MOS target. This invention combines
coprecipitation,
hydrothermal reaction, and
calcination to precisely control the
oxygen content of the powder, resulting in slight
deoxygenation. This prevents the
deoxygenation of In2O3 during the
sintering process of the molded body, which would otherwise affect the
conductivity of the target by generating In2O or InO.