Method for production of metal hydroxide and method for production of ITO sputtering target

Abstract

Provided are a method for production of metal hydroxide highly suited to volume production, whereby it is possible to obtain a metal hydroxide having a uniform desired particle size, without the need for wastewater treatment of the electrolysis solution; and a method for production of ITO sputtering target. A gas diffusion electrode (20) constituted by stacking of a hydrophobic gas diffusion layer (20a) and a hydrophilic reaction layer (20b) is arranged within an electrolysis tank (1), partitioning the electrolysis tank interior. A deposition tank (11) facing the reaction layer of the partitioned electrolysis tank holds an electrolysis solution (S) inside, and indium (4) is immersed into the electrolysis solution. With the gas diffusion electrode as the cathode and the indium as the anode, voltage is applied across the two electrodes, and oxygen is supplied into an air tank (10) facing the gas diffusion layer of the partitioned electrolysis tank to carry out electrolysis, causing indium hydroxide to precipitate into the electrolysis solution.

Description

technical field [0001] The invention relates to a method for manufacturing a metal hydroxide and a method for manufacturing an ITO sputtering target, in particular to a method for manufacturing a metal hydroxide for making an ITO target. Background technique [0002] In flat panel displays such as liquid crystal displays and plasma displays, transparent conductive films of indium tin oxide (hereinafter abbreviated as "ITO") thin films are used as electrodes. In the film formation of the ITO film, it is considered that a sputtering device is widely used in mass production or the like. As this type of sputtering apparatus, an apparatus that applies high-frequency power to an ITO target to form an ITO film is used (for example, refer to Patent Document 1). [0003] Such a method for producing an ITO target is known in Patent Document 2, for example. In this method, first, an electrolytic solution is placed in an electrolytic cell, indium as an anode and a cathode (for example...

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Problems solved by technology

Such an electrolytic solution cannot be reused but is disposed of as a waste liquid. Accordingly, the cost of waste liquid treatment is incurred, the manufacturing cost cannot be reduced, and there is a problem that the operation of replacing the electrolytic solution is required, which significantly impairs mass production.

[0006] In addition, when the composition of the electrolyte changes, the pH and temperature of the electrolyte become unstable

There is also the particle size of the metal hydroxide is easily affected by the pH value and temperature of the electrolyte. When the pH value of the electrolyte is low or the temperature is high, the particle size increases, and it is difficult to obtain a metal hydroxide consistent with the desired particle size. product problem

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