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Method for producing indium hydroxide or compound containing indium hydroxide

An indium hydroxide and compound technology, which is applied in the field of manufacturing indium hydroxide or indium hydroxide-containing compounds, can solve the problems of poor current efficiency, poor sintering characteristics, and inability to improve density, and achieves efficient production and improved sinterability. , the effect of improving productivity

Active Publication Date: 2014-06-11
JX NIPPON MINING & METALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0039] The purpose of the present invention is to solve the problems that arise when indium hydroxide or indium hydroxide-containing compounds are produced by electrolysis, that is, the current efficiency is very poor, and the sintering characteristics are deteriorated during sintering, and the density cannot be increased, thereby suppressing the increase in productivity. decline and decline in quality

Method used

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  • Method for producing indium hydroxide or compound containing indium hydroxide

Examples

Experimental program
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Effect test

Embodiment 1

[0114] Hydroxide was precipitated by electrolysis using an indium plate as an anode, a stainless steel plate as a cathode, and an ammonium nitrate aqueous solution as an electrolytic solution. When the conductivity of the electrolytic solution at this time was set to 10 mS / cm and electrolysis was performed, the current efficiency was 95%.

[0115] This hydroxide was further filtered and washed with pure water until the electric conductivity of the washing liquid was 0.1 mS / cm. It is then dried to form indium oxide, and then sintered at 1500°C to obtain an indium sintered body with a relative density of 98%.

[0116] It should be noted that, although an example of using indium as an anode to precipitate indium hydroxide by electrolysis is given at this time, when an indium alloy such as an indium tin alloy is used, a compound containing indium hydroxide (for example, indium hydroxide and hydroxide The same result can also be obtained when the mixture of tin) is precipitated. ...

Embodiment 2

[0119] Electrolysis was performed by changing the conductivity of the electrolytic solution in Example 1 to 100 mS / cm. The current efficiency at this time was 99%. Then, repulping washing was performed with pure water until the electrical conductivity of the washing liquid was 0.01 mS / cm. Sintering was performed under the same conditions as in Example 1, and as a result, a high-density sintered body having a relative density of 99.5% was obtained.

[0120] It should be noted that, although an example of using indium as an anode to precipitate indium hydroxide by electrolysis is given at this time, when an indium alloy such as an indium tin alloy is used, a compound containing indium hydroxide (for example, indium hydroxide and hydroxide The same result can also be obtained when the mixture of tin) is precipitated.

[0121] As in Example 1, it was confirmed that the relative density was increased by washing indium hydroxide or an indium hydroxide-containing compound, and as a...

Embodiment 3

[0132] In the manufacture of indium hydroxide (In(OH)) from metal indium (In) 3 ) in the electrolysis process, metal indium as a raw material is cast, and an anode plate made of metal indium is manufactured and placed in an electrolytic tank. Cathode plates made of stainless steel plates or titanium plates are alternately arranged in the electrolytic cell. A plurality of these anode plates and cathode plates are arranged in parallel. An electrolytic solution is supplied to the electrolytic cell. Ammonium nitrate solution (NH 4 NO 3 ) as the electrolyte to start electrolysis.

[0133] Next, indium hydroxide particles were precipitated in the electrolytic solution, and the electrolysis was terminated when it reached 80% of the initial weight of the anode plate. The used anode plate is then removed and melted down. During melting, new indium metal is added and cast to remake the anode plate.

[0134] Using the newly produced indium metal anode plate, electrolysis can be st...

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Abstract

A method for producing indium hydroxide or a compound containing indium hydroxide by electrolysis. The purpose of this method is to suppress deterioration of the productivity and deterioration of the quality by performing electrolysis, while setting the electrical conductivity of the electrolyte solution at 10 mS / cm or more, so that indium hydroxide or a compound containing indium hydroxide is precipitated in the electrolyte solution, and then cleaning the thus-precipitated indium hydroxide or compound containing indium hydroxide until the electrical conductivity of the cleaning liquid becomes 1 mS / cm or less.

Description

technical field [0001] The present invention mainly relates to a method for producing indium hydroxide or an indium hydroxide-containing compound, which is indium oxide or an indium oxide-containing compound used for producing an ITO target for sputtering for forming an ITO film. Raw material for compound powder. Background technique [0002] ITO (complex oxide mainly composed of indium-tin) films are widely used as transparent electrodes (films) of display devices including liquid crystal displays. As a method of forming the ITO film, it is generally performed by a method generally called a physical vapor deposition method such as a vacuum vapor deposition method or a sputtering method. In particular, in consideration of operability and film stability, magnetron sputtering is often used for formation. [0003] The formation of the film by the sputtering method is carried out by physically bombarding the target provided at the cathode with positive ions such as Ar ions, an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25B1/00C25B11/04C25B11/10C25B15/08C25D11/34
CPCC25B1/00C25D11/34C25B15/08C25B11/057
Inventor 新藤裕一朗竹本幸一古仲充之
Owner JX NIPPON MINING & METALS CO LTD
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