The invention relates to the technical field of
indium target material preparation, in particular to a high-purity
indium target material preparation method which comprises the following steps: step 1, weighing an
indium raw material, placing the indium
raw material in a mold cavity, and heating to melt the indium
raw material; 2, after the raw material indium is in a
molten state, ultrasonic treatment is conducted, and impurities and an
oxide layer on the surface of
indium metal liquid are scraped away; 3, heating is stopped, demolding is conducted, and an indium target plate blank is obtained; 4, the plate blank is rolled; 5, the rolled plate blank is leveled through a pressing block, and rough
machining is conducted; and 6, the rough-machined plate blank and a
copper back plate are bonded, finish
machining is conducted, and the qualified high-purity indium target material is obtained.By means of the method, the problems that the grain size and texture distribution of the high-purity indium target material are not uniform are solved, the indium target material prepared through the method is higher in purity and density, the grain size of the target material is small (the average grain size is smaller than or equal to 60 micrometers), texture distribution is more uniform, and the quality of the target material is improved. Specific
crystal orientation can be formed, the
sputtering performance of the indium target material is better, and the
utilization rate is higher.