Mask spinning cleaning machine and cleaning method of mask

Abstract

The invention relates to a mask spinning cleaning machine. The machine comprises a mask spinning cleaning machine control circuit, a driving device, a mask clamping device, an outlet valve, a sprinkler head, a gas outlet valve, a jet head, a heating device and a pipeline, wherein the mask spinning cleaning machine control circuit is electrically connected with the driving device, the outlet valve, the gas outlet valve and the heating device and is used for controlling the driving device to drive the mask clamping device to rotate around a rotating shaft, controlling on/off of the outlet valve and the gas outlet valve and controlling the heating device to carry out heating; the outlet valve is connected with the sprinkler head by a water pipe to spray deionized water onto a mask; the gas outlet valve is connected with the heating device and the jet head by a gas pipe in sequence; and the jet head is used for jetting the heated gas onto the mask. The invention also relates to a cleaning method of the mask. The machine and the cleaning method have the following beneficial effects: as the surface of the mask is dried while being spun during cleaning, the mask cleaning efficiency is much higher than that of the traditional technology and watermarks can no longer appear on the surface of the mask; and the mask is directly put into a mask box after being cleaned, thus avoiding secondary contamination.

Description

【Technical field】 [0001] The invention relates to semiconductor manufacturing equipment, in particular to a plate-throwing cleaning machine. 【Background technique】 [0002] A photolithography mask (mask, hereinafter referred to as photolithography) needs to be cleaned regularly after use. [0003] The traditional plate washing machine uses two rows of soft brushes to scrub the front and back sides of the photolithographic plate respectively, and realizes the up and down reciprocating motion through motors, gears and other components, and at the same time, the solenoid valve controls the deionized water for washing. [0004] There are water stains on the surface of the washed photoresist plate, so it needs to be placed in a flower basket and placed in a high-temperature oven for drying. However, even after drying, there may still be watermarks on the surface of the photoresist plate, which will affect the quality of the next photoresist. There is even the possibility of seco...

AI Technical Summary

Problems solved by technology

[0004] There are water stains on the surface of the washed photoresist plate, which needs to be placed in a flower basket and dried in a high-temperature oven. However, even after drying, there may still be watermarks on the surface of the photoresist plate, which will affect the quality of the next photoresist.

Even in the process of sending to the oven, there is the possibility of secondary contamination, which has a great quality hidden danger

In addition, cleaning + oven drying takes a long time, which affects production efficiency

Images