Gyro precession type active stabilizing device for workbench of lithography machine

Abstract

The invention which relates to a gyro precession type active stabilizing device for a workbench of a lithography machine belongs to the semiconductor optical lithography manufacturing technology. The device is characterized in that: a balance mass block which can move in a parallel mode is arranged on a base station; a first X-directional liner motor stator is arranged on one side of the balance mass block, and a second X-directional liner motor stator is arranged on the other side of the balance mass block, wherein the two parts are symmetrical along the X axis; a first X-directional liner motor mover is arranged on the first X-directional liner motor stator in an air floatation mode, and a second X-directional liner motor mover is arranged on the second X-directional liner motor stator in an air floatation mode; a Y-direction guide rail with a Y-directional liner motor stator is rigidly and fixedly arranged between the first X-directional liner motor mover and the second X-directional liner motor mover; a Y-direction liner motor mover is arranged on the Y-directional guide rail in an air floatation mode; a silicon chip supporting bench is fixed on the side part of the Y-directional liner motor mover; a silicon chip bench supporting seat which is connected to the base station in an air floatation mode is rigidly connected with the silicon chip supporting bench; and a first gyro active stabilizing apparatus, a second gyro active stabilizing apparatus, a third gyro active stabilizing apparatus and a fourth gyro active stabilizing apparatus which are respectively formed by a steering engine, a mechanical gyroscope, and a gyroscope mounting seat are respectively arranged in four grooves at four corners of the balance mass block. The device of the invention has the advantages of good compensation instantaneity, small vibration, and high positioning precision.

Description

technical field [0001] The invention belongs to the technical field of semiconductor optical lithography manufacturing, and mainly relates to an ultra-precision silicon wafer motion positioning system in a lithography machine, in particular to a high-speed workpiece table positioning system with a balanced mass vibration damping device. Background technique [0002] Optical lithography technology is the mainstream technology in the semiconductor chip manufacturing industry. Compared with other lithography technologies, optical lithography technology has the advantages of high productivity and high positioning accuracy. As one of the most important processes in the front-end production process of integrated circuit chips, its basic principle is to use photoresist as an intermediate medium to realize the transformation, transfer and processing of graphics, and finally transfer the image information to the silicon wafer. A process in which the designed circuit diagram on the ma...

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Problems solved by technology

[0013] The above-mentioned structure has a direct effect and a simple principle, but due to passive detection, the control system has a certain delay, and it is difficult to suppress Rz in time, and the torsion direction of the balance mass along the Z-axis changes frequently, requiring frequent changes in the speed and rotation direction of the momentum wheel , poor real-time control

In order to balance the relationship between torque magnitude and response speed, the torque and speed of the motor, the mass and dynamic balance of the rotary body need to be precisely matched, otherwise the high-speed rotation of the rotary body and frequent acceleration and deceleration will bring additional vibration, making the motor's It is also difficult to choose

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