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Method for transferring photochemical relief miniature image onto pigment surface

A technology of image transfer and image, which is applied in the direction of photographic plate-making process, optics, and optomechanical equipment on the patterned surface, can solve problems such as inclusions, inability to prepare pigment flakes, and inability to produce pigment flakes, etc., to achieve good results and good optical anti-counterfeiting pattern effect

Active Publication Date: 2014-03-26
甄健
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Patent No. 99809384.X "Inorganic Flakes with Marks for the Production of Pigments" discloses a method for manufacturing pigment flakes with marks, but the method is to obtain pigment flakes by crushing, and the pigment flakes are not uniform The shape of the paint chip, the graphic information on the paint chip is very likely to be unable to be completely displayed in a paint chip
[0003] Patent No. 200810084421.1 "Surface Treatment Flakes" discloses a method for manufacturing pigment flakes with marks, which has been greatly improved on the basis of 99809384.X. This method can prepare pigment flakes with geometric shapes , and the graphic information is completely displayed on a pigment chip; the defect is that the pigment chip must have a regular geometric shape, and the pigment chip with any frame shape cannot be prepared. In addition, during the preparation process, the distance between the pigment chips will also be Clearly formed rectangular pigment flakes of different sizes, these rectangular pigment flakes do not have the required marks recorded on them, and are included in the marked pigment flakes as pigment impurities
[0004] Patent No. 201010528271.6 "Substrate and Method for Manufacturing Polygonal Flakes" solves the problem of impurities in pigments to a certain extent, but its limitation is that it cannot produce pigment flakes of any shape and size

Method used

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  • Method for transferring photochemical relief miniature image onto pigment surface
  • Method for transferring photochemical relief miniature image onto pigment surface
  • Method for transferring photochemical relief miniature image onto pigment surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] The method for transferring the actinic relief miniature image to the surface of the pigment in this embodiment comprises the following steps:

[0062] Provide base material;

[0063] Dilute the photoresist and evenly paint it on the surface of the base material;

[0064] Part of the image on the surface of the photoresist coating is exposed, and the rest is blocked, and then the photoresist coating is exposed;

[0065] Developing and fixing to obtain an actinic micro-relief image;

[0066] Depositing a thin film layer of pigment;

[0067] Pigment film layer peeled off.

[0068] The produced actinic relief miniature image, that is, each image of said image portion has a radial dimension of 1-100 microns, preferably 5-30 microns.

Embodiment 2

[0070] The method for transferring the actinic relief miniature image to the surface of the pigment in this embodiment comprises the following steps:

[0071] Apply diluted photoresist evenly on the surface of the metal substrate;

[0072] Expose the image part on the surface of the photoresist coating, block the non-image part, and then expose the photoresist coating;

[0073] Developed and fixed, obtained as figure 1 Shown is a metal substrate with its surface partially covered by photoresist: the photoresist coating of the image portion 10 is stripped away, exposing the surface of the metal substrate, while the non-image portion 20 is still coated with photoresist. layer coverage;

[0074] The first electroplating thin film on the surface of the metal substrate: as figure 2 As shown, the image portion 10 is covered by the electroplating film layer for the first time, and the non-image portion 20 is still covered by the photoresist coating;

[0075] Paint the diluted p...

Embodiment 3

[0093] Apply diluted photoresist evenly on the surface of the metal substrate;

[0094] Blocking the image part of the photoresist coating surface, exposing the non-image part, and then exposing the photoresist coating;

[0095] Developing and fixing, the image part is still covered by the photoresist coating, and the photoresist coating of the non-image part is peeled off, exposing the surface of the metal substrate;

[0096] Electroplating a film on the surface of the metal substrate: the non-image part is covered by the electroplating film layer, and the image part is still covered by the photoresist coating;

[0097] The photoresist is stripped to obtain a master plate in which the non-image part is raised and the image part is exposed to the metal substrate;

[0098] embossing the mark recording layer with said master, transferring the image information of the master onto the mark recording layer; depositing a pigment thin film layer on the mark recording layer with imag...

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Abstract

The invention provides a method for transferring a photochemical relief miniature image onto a pigment surface, which comprises the following steps of: providing a substrate material; diluting a photoresist and evenly coating the photoresist on a surface of the substrate material; exposing an image part on the surface of the photoresist coating with the rest part blocked, then carrying out exposure to the photoresist coating; carrying out development and fixation to obtain a photochemical relief miniature image; depositing a pigment membrane layer; and peeling off the pigment membrane layer. Through observing the anti-counterfeiting pigment obtained by the method provided by the invention, an edge contour of the pigment and graphic messages on two surfaces of the pigment can be seen; as to a second-line anti-counterfeiting function, the authenticity of products protected by the pigment and the flow channel of the products can be more directly and effectively.

Description

technical field [0001] The invention relates to the field of anti-counterfeiting materials, in particular, the invention relates to a method for transferring photochemical relief miniature images to pigment surfaces. Background technique [0002] Patent No. 99809384.X "Inorganic Flakes with Marks for the Production of Pigments" discloses a method for manufacturing pigment flakes with marks, but the method is to obtain pigment flakes by crushing, and the pigment flakes are not uniform The graphic information on the paint flakes is very likely to be unable to be completely displayed in one paint flake. [0003] Patent No. 200810084421.1 "Surface Treatment Flakes" discloses a method for manufacturing pigment flakes with marks, which has been greatly improved on the basis of 99809384.X. This method can prepare pigment flakes with geometric shapes , and the graphic information is completely displayed on a pigment chip; the defect is that the pigment chip must have a regular geom...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09C1/00G03F7/00
Inventor 甄健
Owner 甄健