Film coating piece and preparation method thereof

Abstract

The invention provides a film coating film, comprising a base material and a film layer formed on the surface of the base material; the film layer consists of a plurality of discontinuous film layer areas; the area of each film layer area is 0.001-0.025 sq.mm.; and the distance between the adjacent film layer areas is 0.02-0.04mm. The invention further provides the preparation method of the film coating piece, comprising the following steps: providing the base material, wholly spraying photo-resist on the surface of the base material to be coated, thermally processing and naturally cooling the base material sprayed with the photo-resist in order, exposing the surface of the base material in the manner of a plurality of discontinuous areas, forming a film layer on the surfaces of the base material and the photo-resist, and removing the photo-resist and the film layer formed on the surface of the photo-resist. The surface of the film coating piece prepared by the invention has good mist effect, soft appearance and good texture. The preparation method of the film coating piece in the invention avoids the complex exposing and developing process; and the technology is simpler, and is easily operated.

Description

technical field [0001] The invention relates to a coating piece and a preparation method thereof. Background technique [0002] There are many methods for preparing decorative patterns on the surface of electronic products. Using PVD coating film to form the required pattern on the surface of the substrate is very popular because of the advantages of concave-convexity, high precision, and good aesthetic effect. This type of method usually deposits a thin film layer or multiple thin film layers on the surface of the substrate, and then forms the desired pattern effect by laser engraving or chemical etching; or first forms a photosensitive masking layer on the substrate, and uses exposure and development and other chemical methods to remove the photosensitive mask where the pattern needs to be formed, and then deposit a film layer on the exposed substrate to form the desired pattern. [0003] Due to the needs of product design, it is sometimes necessary to form a film layer ...

AI Technical Summary

Problems solved by technology

However, the process steps of this method are cumbersome, and the technology of exposing the surface of the substrate in discontinuous small areas by exposure and development technology is difficult to realize.

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