Degumming technology for aqueous solution of methanesulfonic acid

A technology of methanesulfonic acid and aqueous solution, which is applied in the direction of sustainable manufacturing/processing, cleaning methods using liquids, electrical components, etc., can solve the problems of high cost, irritating odor, and high cost of degumming, and achieve low cost and detachment The effect of fully and shortening the degumming time

Inactive Publication Date: 2012-06-20
KONCA SOLAR CELL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] Monocrystalline silicon and polycrystalline silicon play an important role in the field of solar cells. During the production process, the silicon material needs to be cut in multiple lines. First, the monocrystalline silicon rod or polycrystalline silicon ingot is bonded to the glass plate or resin plate base by epoxy resin. On the material, after the monocrystalline silicon rod or polycrystalline silicon ingot is cut, the cutting fixture, the cutting substrate and the cut silicon wafer are transferred to the degumming machine with special tools for rinsing and degumming. Generally, it is divided into three steps: washing 1. Ultrasonic cleaning and acid immersion degumming have the following disadvantages in the acid immersion process: (1), silicon wafers cannot be fully detached, and the degumming time is longer. When the prepared lactic acid concentration is 10% to 60%, the temperature is 30 ° C to The immersion time is 200-600 seconds at 75°C, which is relatively long; (2) the adhesive strip is too detached, and the adhesive strip is caught in the middle of the silicon wafer after falling off, which is difficult to clean; (3) lactic acid degumming or citric acid degumming A pungent smell will be produced during the process; (4) The cost of degumming is relatively high. Taking the DS271 model as an example, the lactic acid used for single-pole degumming is about 2.0kg, and the cost is about 20-25 yuan, which is relatively high

Method used

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  • Degumming technology for aqueous solution of methanesulfonic acid
  • Degumming technology for aqueous solution of methanesulfonic acid
  • Degumming technology for aqueous solution of methanesulfonic acid

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Embodiment Construction

[0017] Such as Figure 1~2 As shown, in Example 1, the methanesulfonic acid aqueous solution degumming process of the present invention includes the following steps: a. Add a certain amount of water to the acid soak tank of the degumming machine, set the heating temperature to 60°C, and turn on Switch for heating; b. Add a certain amount of methanesulfonic acid with a concentration of 1% into the acid immersion tank of the degumming machine; c. Put the washed and ultrasonically washed silicon wafer 1 and the cutting substrate 2 into the acid immersion tank Soak in medium for 300 seconds; d. Lift the substrate 2 with a special tool, and remove a small amount of silicon wafers 1 that have not fallen off. The percentage of silicon wafers 1 falling off is greater than 90%.

[0018] In Example 2, the methanesulfonic acid aqueous solution degumming process of the present invention includes the following steps: a. Add a certain amount of water to the acid soak tank of the degumming mach...

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Abstract

The invention discloses a degumming technology for the aqueous solution of methanesulfonic acid. The technology comprises the following steps of: a, adding a certain amount of water into an acid soaking tank of a degumming machine, setting the heating temperature, and turning on a switch for heating; b, adding a certain amount of methanesulfonic acid with a prepared concentration into the acid soaking tank of the degumming machine; c, putting a silicon wafer after flushing and ultrasonic washing and a cutting substrate together into the acid soaking tank to soak for some time; and d, lifting the cutting substrate by a special tool, and taking down a few silicon wafers which do not drop. The technology adopts the aqueous solution of methanesulfonic acid in the acid soaking process, has the advantages of sufficient silicon wafer separation and low cost, can shorten the degumming time and does not produce gas with irritant odor.

Description

Technical field [0001] The invention relates to a process for degumming single and polycrystalline silicon wafers, in particular to a process for degumming single and polycrystalline silicon wafers by using an aqueous solution of methanesulfonic acid. Background technique [0002] Monocrystalline silicon and polycrystalline silicon play an important role in the field of solar cells. In the production process, the silicon material needs to be cut by multiple wires. First, the monocrystalline silicon rod or polycrystalline silicon ingot is bonded to the glass plate or resin plate base through epoxy resin. On the material, after the monocrystalline silicon rod or polycrystalline silicon ingot is cut, the cutting jig, the cutting substrate and the completed silicon wafer are transferred to the degumming machine with special tools for washing and degumming. Generally, there are three steps: washing , Ultrasonic washing and acid immersion degumming, there are the following shortcomings...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08B08B3/10H01L31/18
CPCY02P70/50
Inventor 刘宏华王欣杨风彦袁仲明
Owner KONCA SOLAR CELL
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