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On-line testing structure for polycrystalline silicon material residual stress

A technology of residual stress and online testing, which is applied in the fields of material resistance, force/torque/power measuring instrument, semiconductor/solid-state device testing/measurement, etc., can solve the problems of device design and performance prediction uncertainty, instability, etc. The effect of simple signal loading and measurement, simple method, and low requirements for test equipment

Inactive Publication Date: 2012-07-11
SOUTHEAST UNIV
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0002] The performance of microelectromechanical devices is closely related to material parameters. Due to the influence of processing, some material parameters will change. These uncertain factors caused by processing technology will make device design and performance prediction uncertain and unstable. Case

Method used

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  • On-line testing structure for polycrystalline silicon material residual stress
  • On-line testing structure for polycrystalline silicon material residual stress
  • On-line testing structure for polycrystalline silicon material residual stress

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Embodiment Construction

[0012] The present invention will be further described below in conjunction with the accompanying drawings.

[0013] Such as figure 1 and figure 2 As shown, the polysilicon material residual stress on-line testing structure of the present invention includes three deflection pointers with the same basic structure, and each deflection pointer includes a horizontal driving beam 101, 103, 105, and a vertical driving beam 101, 103, 105. pointers 102, 104, 106 and two anchor regions fixed on the substrate, and the two anchor regions respectively fix one end of the driving beam 101, 103, 105 and one end of the pointer 102, 104, 106. The main body of the test structure is fabricated from polysilicon material.

[0014] The three polysilicon deflection pointers are placed in the shape of "pin", and the pointers 102, 104, and 106 all point to the center; the upper polysilicon deflection pointer includes the driving beam 101, the pointer 102, the anchor areas 107, 108 and the metal ele...

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Abstract

The invention discloses an on-line testing structure for polycrystalline silicon material residual stress, which includes three polycrystalline silicon deflecting pointers with identical basic structures, wherein the three polycrystalline silicon deflecting pointers are arranged in a triangular way with the pointers pointed to the center, and the initial deflection directions of the pointers under the residual stress action are controlled so as to enable the interval retaining and interval variation to effectively reflect the size and quality of the residual stress; the manufacturing technology of the testing structure is simple without any special machining requirements; and thermal drive is adopted during the testing, and the testing parameters are the resistances of the drive beam before and after the thermal driving. Even though the thermal expansion principle is adopted during the use, the measuring instrument doesn't need the coefficient of thermal expansion, so that the measurement result is free from the error caused by on-line testing the coefficient of thermal expansion. The invention has the advantages that the testing structure is simple, the electric signal loading and measuring are convenient, and the calculating method is stable.

Description

technical field [0001] The invention relates to an on-line testing structure for polysilicon material residual stress, and belongs to the technical field of on-line testing of micro-electromechanical systems (MEMS) material parameters. Background technique [0002] The performance of microelectromechanical devices is closely related to material parameters. Due to the influence of processing, some material parameters will change. These uncertain factors caused by processing technology will make device design and performance prediction uncertain and unstable. Case. The purpose of online testing of material parameters is to measure the material parameters of MEMS devices manufactured by a specific process in real time, monitor the stability of the process, and feed back the parameters to the designer so that the design can be corrected. Therefore, online testing without leaving the processing environment and using general-purpose equipment has become a necessary means of proce...

Claims

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Application Information

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IPC IPC(8): G01N27/04G01L5/00
CPCG01B21/32H01L22/34G01B7/16G01N27/04G01L1/00G01L5/0047
Inventor 李伟华张卫青蒋明霞周再发刘海韵
Owner SOUTHEAST UNIV
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