Bidirectional triode thyristor based on diode auxiliary triggering

A diode-assisted, silicon device technology, applied in the field of bidirectional thyristor devices, can solve problems such as low trigger voltage, difficult to protect gate oxide, and non-adjustable, and achieve the effect of low trigger voltage and low ESD protection

Inactive Publication Date: 2012-07-11
ZHEJIANG UNIV
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  • Abstract
  • Description
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Problems solved by technology

[0006] figure 1 It is a unidirectional SCR structure under the CMOS process. The trigger voltage of the unidirectional SCR is high in one direction, and it is a parasitic diode structure in the other direction. The trigger voltage is very low and cannot be adjusted. Therefore, the structure is very It is difficult to directly apply on-chip ESD protection, especially in some mixed voltage domain interface circuits that require bidirectional trigger voltage adjustable and low ESD protection
[0007] figure 2 It is a bidirectional SCR structure under the CMOS process. Compared with the unidirectional SCR structure, this structure has the same trigger voltage in both directions, but the trigger voltage value is also too high and cannot be adjusted. In the deep submicron process, it is difficult to Protect the fragile gate oxide

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  • Bidirectional triode thyristor based on diode auxiliary triggering
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  • Bidirectional triode thyristor based on diode auxiliary triggering

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Embodiment Construction

[0031] In order to describe the present invention more specifically, the technical solutions and related principles of the present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0032] Such as image 3 with Figure 4 As shown, a triac device based on diode-assisted triggering includes:

[0033] P substrate layer 10 and two diode links;

[0034] On the P substrate layer 10, a first N well 21, a P well 23 and a second N well 22 are sequentially arranged from left to right, and the P well 23 is connected side by side with the first N well 21 and the second N well 22;

[0035] The first N+ active injection region 41, the first P+ active injection region 51 and the second N+ active injection region 42 are arranged side by side from left to right on the first N well 21; on the second N well 22, from left to right The third N+ active injection region 43, the second P+ active injection region 52 and the fourth N...

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Abstract

The invention discloses a bidirectional triode thyristor based on diode auxiliary triggering, which comprises a P substrate layer and two diode links, wherein a first N well, a P well and a second N well are arranged on the P substrate layer; a first N plus active implantation area, a first P plus active implantation area and a second N plus active implantation area are arranged on the first N well; a third N plus active implantation area, a second P plus active implantation area and a fourth N plus active implantation area are arranged on the second N well; and the third N plus active implantation area is connected with the anode of a first diode link, and the second N plus active implantation area is connected with the anode of a second diode link. The bidirectional triode thyristor utilizes diodes as auxiliary triggering units, so the thyristor has adjustable and lower forward and reverse breakdown voltages, can be suitable to on-chip electronic static discharge (ESD) protection in a deep sub-micron technology, and can be particularly suitable to the ESD protection and application of a plurality of mixing voltage interface circuits or different power supply areas.

Description

technical field [0001] The invention belongs to the technical field of electrostatic protection for integrated circuits, and in particular relates to a bidirectional thyristor device based on diode auxiliary triggering. Background technique [0002] The phenomenon of electrostatic discharge (ESD) in nature poses a serious threat to the reliability of integrated circuits. In the industry, 30% of the failures of integrated circuit products are caused by electrostatic discharge, and the increasingly smaller process size and thinner gate oxide thickness greatly increase the probability of integrated circuit damage by electrostatic discharge. Therefore, improving the reliability of integrated circuit electrostatic discharge protection has a non-negligible effect on improving the yield of products. [0003] The modes of electrostatic discharge phenomena are usually divided into four types: HBM (Human Body Model), MM (Machine Discharge Model), CDM (Component Charge Discharge Model...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/06H01L29/74
Inventor 郑剑锋韩雁马飞董树荣吴健苗萌曾杰
Owner ZHEJIANG UNIV
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