Electron density control system of large-area uniform plasmas

A plasma and electron density technology, applied in the field of plasma, can solve the problems of low control precision, short duration, difficult to control, etc., and achieve the effect of improving control precision, improving stability and eliminating errors

Inactive Publication Date: 2012-07-11
XIDIAN UNIV
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  • Abstract
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  • Application Information

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Problems solved by technology

[0005] 1. The shock tube uses the instantaneous high temperature generated by the high pressure difference to generate plasma, the duration is extremely short, the stability is extremely poor, and it is difficult to control
[0006] 2. Although the plasma produced by the arc wind tunnel and plasma jet can work for a long time, the electron density can be adjusted continuously and is relatively stable, but due to the high temperature in the environment, its electron density is difficult to measure, and the estimation method is generally used OK, the control accuracy is extremely low
[0007] 3. Although the plasma generated by glow discharge has the advantages of easy control, no harsh conditions, and continuous adjustment of electron density, but because it adjusts the electron density value by adjusting the power based on experience, without feedback control, as shown in the attached figure 1 As shown, or only by measuring the voltage between the electrodes, the electron density is deduced, and then the feedback control is performed, and the electron density value of the plasma is not only related to the discharge power and the voltage between the electrodes, but also related to other factors such as the gas temperature and so on. Changing factors are related, so the long-term stability of electron density is poor, and the control accuracy is low

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  • Electron density control system of large-area uniform plasmas
  • Electron density control system of large-area uniform plasmas
  • Electron density control system of large-area uniform plasmas

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Embodiment Construction

[0026] Refer to attached figure 2 , the large-area uniform plasma electron density control system of the present invention includes: a plasma generation chamber 1, a diagnostic device 2, a power supply device 3, a vacuum device 4 and a control device 5, the diagnostic device 2, the power supply device 3 and the vacuum device 4 are respectively connected to the plasma generation chamber 1, and the control device 5 is respectively connected to the diagnostic device 2, the power supply device 3 and the vacuum device 4, wherein:

[0027] Plasma generation cavity 1 comprises: cylindrical housing 114, observation window 105, hinged window 106, mesh discharge electrode 101, air extraction hole 102, gas filling hole 103, electrode through hole 104, fastening knob 107, hinge 108, sealing Rubber pad 109, insulating glue column 110, electrostatic probe through hole 111, electrostatic probe 112 and through hole 113;

[0028] The diagnostic device 2 includes a measurement unit 201 and a ...

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Abstract

The invention discloses an electron density control system of large-area uniform plasmas, and mainly solves the problems in the present plasma electromagnetic wave propagation experimental device that the electron density cannot be continuously adjusted, the long-time stability is poor and the control accuracy is low. The whole system comprises a plasma producing cavity (1), a diagnosis device (2), a power supply device (3), a vacuum device (4) and a control device (5), wherein the control device (5) is used for reading an electron density value measured by the diagnosis device (2), comparing the electron density value with a preset electron density value and outputting a voltage or air pressure control signal according to a comparative difference value; and the output power of the power supply device (3) or a set air pressure value of the vacuum device (4) is adjusted, so as to enable the electron density of the plasmas to be stabilized within a preset value range. The electron density control system has the advantages that by adopting a feedback control principle, the adjustment and the stabilization of the electron density in the large-area uniform plasmas are realized; and the electron density control system can be used for conducting propagation experiments of electromagnetic waves in plasmas with different electron density.

Description

technical field [0001] The invention belongs to the field of gas discharge plasma, and relates to a large-area uniform plasma electron density control device, which can be used for adjusting and stabilizing the electron density in a large-area uniform plasma, and performing electromagnetic waves in plasmas with different electron densities. Spread experiment. Background technique [0002] Studying the propagation characteristics of electromagnetic waves in plasma and the interaction between plasma and electromagnetic waves is the basis and key content of research work such as spacecraft reentry, ionosphere research, and plasma stealth technology. In the theoretical research process, the plasma is generally assumed to be uniform and stable, or the plasma is layered according to the electron density, and the electron density in each layer is uniform and stable. Therefore, controlling the electron density of the plasma to stabilize the set value for a long time is helpful to c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/00
Inventor 李小平谢楷刘彦明刘东林石磊杨敏高平
Owner XIDIAN UNIV
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